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Manufacturing method of micro-lens array

A technology of microlens array and photoresist, which is applied in the direction of lens, photomechanical equipment, photoplate making process of pattern surface, etc., to achieve the effect of high hardness, good thermal conductivity and good chemical stability

Inactive Publication Date: 2015-04-08
CHENGDU NAGUANG TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

There is no report about the sapphire glass microlens array and the manufacturing method

Method used

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  • Manufacturing method of micro-lens array
  • Manufacturing method of micro-lens array
  • Manufacturing method of micro-lens array

Examples

Experimental program
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preparation example Construction

[0029] figure 1 The preparation method of the microlens array of the present invention has been shown, comprising the following steps:

[0030] 1) Use laser direct writing machine or electron beam direct writing machine to make the target structure mask; the resolution of laser direct writing machine is 0.5 microns, and the precision of electron beam direct writing machine is better than laser direct writing. When it comes to graphics, the accuracy and consistency of micro graphics can be guaranteed;

[0031] 2) Apply a layer of photoresist evenly on the sapphire glass substrate by using a centrifugal coating machine;

[0032] 3) Apply photolithography technology to transfer the mask pattern of the target structure to the sapphire glass substrate to obtain a photoresist micropattern; use the prepared mask to expose the photoresist resist, and the photoresist can be obtained after development The micro-relief structure of the resist material; determine the exposure amount to ...

Embodiment 1

[0036] Example 1, the sub-aperture prepared by the method of the present invention is 0.5mm × 0.5mm, and the microlens array whose sagittal height is 2.5 microns

[0037] 1) Design the microlens lithography mask first, and determine the size, shape, and number of arrays of the microlens. Design the shape of the microlens to be square, the size is 0.5mm×0.5mm, and then use the laser direct writing machine to make the target structure mask according to the designed mask data;

[0038] 2) Uniformly coat a layer of AZ9260 photoresist on the sapphire glass substrate with SUSS RC8 coater;

[0039] 3) Expose and develop the resist using the fabricated target structure mask; according to the depth of the photoresist, use an exposure amount of 30mJ / cm 2 , developer MF319, concentration 100%, developing time 145s. Obtain the required microarray template structure on the photoresist surface by exposure and development, see figure 2 ;

[0040] 4) Heating to 120°C with an electric hea...

Embodiment 2

[0043] Embodiment 2 A sapphire glass microlens array with a sub-aperture of 1 mm × 1 mm and a height of 7.5 microns made by the method described in the present invention

[0044] 1) First design the microlens lithography mask, determine the size, shape, and number of arrays of the microlens: design the shape of the microlens as a regular hexagon, with a size of 1mm×1mm, and then use the laser direct writing machine to make it according to the designed mask data The target structure mask of ;

[0045] 2) Uniformly coat a layer of AZ9260 photoresist on the sapphire glass substrate with SUSS RC8 coater;

[0046]3) Expose and develop the resist using the fabricated target structure mask; according to the depth of the photoresist, use an exposure amount of 40mJ, a developer solution MF319, a concentration of 100%, and a developing time of 180s to expose and develop on the surface of the photoresist Obtain the required microarray template structure;

[0047] 4) Heating to 130°C wi...

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Abstract

The invention discloses a manufacturing method of a micro-lens array made of a sapphire glass material. The manufacturing method comprises the following steps: (1) manufacturing a target structure mask plate; (2) coating a photoresist layer on a washed sapphire glass substrate; (3) transfer-printing the patterns of the target structure mask plate on the sapphire glass substrate by photo-etching; (4) heating the sapphire glass substrate to obtain a photoresist micro-lens array template; (5) etching the sapphire glass substrate on which the photoresist micro-lens array is manufactured by using an ion beam etching machine; (6) completely removing the photoresist from the sapphire glass substrate to obtain a micro-lens array which takes sapphire glass as a structural layer and a base. The micro-lens array manufactured by the method disclosed by the invention has the characteristics of high temperature resistance, good heat conductivity, high hardness, infrared transmission, good stability, wide application and the like.

Description

technical field [0001] The invention belongs to the technical field of micromachining, and in particular relates to a preparation method of a microlens array. Background technique [0002] In recent years, with the development of microfabrication technology and optical materials, and the broadening of laser application fields, optical components are not only traditional refracting lenses, prisms, and mirrors, but are also expanding towards ultra-large and miniaturized. New optical components such as microlens arrays are also increasingly used in various optoelectronic instruments, making optoelectronic instruments and their components more miniaturized and integrated. The microlens array is a key component in the manufacture of small optoelectronic systems. It has the advantages of small size and light weight, and can realize new functions such as micro, array, integration, imaging and wavefront conversion that are difficult to achieve with ordinary optical components. Can ...

Claims

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Application Information

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IPC IPC(8): G02B3/00G02B1/00G03F7/00
CPCG02B3/0012G02B1/00
Inventor 龙冈
Owner CHENGDU NAGUANG TECH
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