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Solar cell preparation method capable of finishing diffusion, surface passivation and anti-reflection in one step

A solar cell and anti-reflection technology, applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of no significant cost reduction, high solar cell cost, complex manufacturing process, etc., and achieve low cost, high conversion efficiency, and equipment requirements. low effect

Inactive Publication Date: 2015-04-08
FUDAN UNIV
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  • Description
  • Claims
  • Application Information

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Problems solved by technology

The equipment is expensive and the manufacturing process is complicated, so the cost of solar cells is relatively high
[0003] In recent years, although new technologies for manufacturing silicon solar cells have emerged, such as ion implantation technology, plasma etching texturing technology, selective emitter technology, copper grid line technology, ultra-thin silicon wafer technology, back junction and back contact technology , heterojunction technology, etc., but these technologies did not significantly reduce costs while improving efficiency, and some technologies increased expensive equipment and complicated processes

Method used

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  • Solar cell preparation method capable of finishing diffusion, surface passivation and anti-reflection in one step
  • Solar cell preparation method capable of finishing diffusion, surface passivation and anti-reflection in one step

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Embodiment Construction

[0019] The following examples are used to illustrate the present invention, but not to limit the present invention.

[0020] Preparation process of solar cells:

[0021] 1) The silicon wafer is a p-type monocrystalline silicon wafer (100) with a thickness of 150 microns and a resistivity of 1-10 ohm cm.

[0022] 2) The phosphor slurry is spin-coated on the surface of the silicon wafer by the spin-coating method, the spin-coating speed is 3000 rpm, and the time is 30 seconds.

[0023] 3) The silicon wafer is heated in the air atmosphere for 5 minutes to 2 hours, and the heating temperature is 800°C-900°C. At this time, the diffusion pn junction, the passivation of the upper and lower electrodes and the preparation of the anti-reflection film are completed at the same time.

[0024] 4) The upper electrode is an evaporated or screen-printed silver electrode, and the lower electrode is an evaporated and screen-printed Al electrode.

[0025] 5) Annealing at 300°C-550°C for 2min-1...

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Abstract

The invention belongs to the technical field of solar photovoltaic cells, in particular to a solar cell preparation method capable of finishing diffusion, surface passivation and anti-reflection in one step. The solar cell preparation method capable of finishing diffusion, surface passivation and anti-reflection in one step includes steps that spin-coating or spraying a diffusion source or a gas source to the surface of a semiconductor chip; heating the semiconductor chip in the air, and meanwhile, forming a p-n junction, and passivation layers and anti-reflection films at the upper and lower surfaces; preparing an upper electrode and a lower electrode. The solar cell preparation method capable of finishing diffusion, surface passivation and anti-reflection in one step greatly simplifies the solar cell preparation technique based on guaranteeing a high conversion efficiency of the cell, and moreover, the solar cell preparation method has low requirement on equipment, the preparation process is safe, nontoxic and simple, and the cost is low.

Description

technical field [0001] The invention belongs to the technical field of solar photovoltaic cells, and in particular relates to a method for preparing a solar cell. Background technique [0002] At present, the focus of the photovoltaic industry is cost, especially for silicon solar cells with mature technology, the cost must be reduced under the premise of ensuring efficiency. Conventional silicon solar cells generally require cleaning and texturing equipment to make texture, diffusion equipment to form pn junctions, passivation material equipment to prepare passivation layers on the upper and lower surfaces, anti-reflection film equipment to prepare anti-reflection films, and metal electrode manufacturing equipment to manufacture positive and negative electrodes. . The equipment is expensive and the manufacturing process is complicated, so the cost of solar cells is relatively high. [0003] In recent years, although new technologies for manufacturing silicon solar cells h...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18
CPCH01L31/1864H01L31/1868H01L31/1876Y02E10/50Y02P70/50
Inventor 王亮兴陆明
Owner FUDAN UNIV