Solar cell preparation method capable of finishing diffusion, surface passivation and anti-reflection in one step
A solar cell and anti-reflection technology, applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of no significant cost reduction, high solar cell cost, complex manufacturing process, etc., and achieve low cost, high conversion efficiency, and equipment requirements. low effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0019] The following examples are used to illustrate the present invention, but not to limit the present invention.
[0020] Preparation process of solar cells:
[0021] 1) The silicon wafer is a p-type monocrystalline silicon wafer (100) with a thickness of 150 microns and a resistivity of 1-10 ohm cm.
[0022] 2) The phosphor slurry is spin-coated on the surface of the silicon wafer by the spin-coating method, the spin-coating speed is 3000 rpm, and the time is 30 seconds.
[0023] 3) The silicon wafer is heated in the air atmosphere for 5 minutes to 2 hours, and the heating temperature is 800°C-900°C. At this time, the diffusion pn junction, the passivation of the upper and lower electrodes and the preparation of the anti-reflection film are completed at the same time.
[0024] 4) The upper electrode is an evaporated or screen-printed silver electrode, and the lower electrode is an evaporated and screen-printed Al electrode.
[0025] 5) Annealing at 300°C-550°C for 2min-1...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 