Composite channel MHEMT (Metamorphic High Electron Mobility Transistor) microwave oscillator and preparation method thereof
A microwave oscillator and composite channel technology, applied in the direction of electric solid-state devices, semiconductor devices, electrical components, etc., can solve the problems of limiting the development of HEMT devices on GaAs substrates, high manufacturing costs of InP substrates, and small dynamic range of devices. Achieve strong practicability and utilization value, enhance the concentration of two-dimensional electron gas and electron mobility, and achieve the effect of low phase noise
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[0032] A preparation method of a composite channel MHEMT microwave oscillator, comprising the steps of:
[0033] Step 1: Epitaxial material growth.
[0034] On the GaAs semi-insulating substrate layer, a 500nm variable In composition InAlAs buffer layer and a 300nm In 0.52 al 0.48 As buffer layer, 7.5nm In 0.6 Ga 0.4 As conductive channel layer, 7.5nm In 0.7 Ga 0.3 As conductive channel layer, 4nm In 0.52 al 0.48 As isolation layer, 8nm In 0.52 al 0.48 As barrier layer, 5nm InP etch stop layer, 20nm In 0.53 Ga 0.47 As cap layer, 5nm In 0.65 Ga 0.35 The As cap layer forms a GaAs substrate variable composition epitaxial material structure. see figure 1 It is a structural diagram of a composite channel GaAs substrate variable composition epitaxial material.
[0035] Step 2: device isolation is formed.
[0036]Uniform photolithography to protect the table. First, the surface of the sample was pretreated with HMDS in order to enhance the adhesion of the photoresist...
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