Moisturizing mask liquid and preparation method thereof

A film liquid and wet face technology, which is applied in the field of moisturizing mask liquid and its preparation, can solve the problems of failure to fundamentally improve skin problems, unsatisfactory moisturizing effect, and no composition, etc. Resistance, perfect moisturizing and water-locking performance, excellent moisturizing effect

Active Publication Date: 2015-09-09
广州科玛生物科技股份有限公司
View PDF11 Cites 23 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] Snail liquid, deep-sea salmon collagen, Gynostemma pentaphyllum extract, grass green salicornia extract, fermented natto essence and oat β-glucan are all used in moisturizing cosmetics, but their composition has not been seen yet, and the composition Application in facial mask
[0013] Simultaneously, the hydrating and moisturizing effect for the moisturizing mask currently on the market is unsatisfactory, the safety is unstable, and skin problems cannot be fundamentally improved. moisturizing facial mask

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Moisturizing mask liquid and preparation method thereof
  • Moisturizing mask liquid and preparation method thereof
  • Moisturizing mask liquid and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] Embodiment 1, moisturizing mask liquid of the present invention and preparation thereof

[0039] Formula: by weight percentage, water 85.61%, glycerin 3%, propylene glycol 3%, polyglycerol-10 3%, hydroxyethyl urea 1.5%, snail liquid 0.5%, deep-sea salmon collagen 0.5%, Jiaogulan extract 0.5% , Grass green salicornia extract 0.5%, natto fermented essence 0.5%, oat β-glucan 0.5%, carbomer 0.1%, triethanolamine 0.1%, sodium hyaluronate 0.03%, methylparaben 0.1% , phenoxyethanol 0.5% and fragrance 0.06%.

[0040] Preparation: (1) Water, glycerin, propylene glycol, polyglycerol-10, hydroxyethyl urea, snail liquid, deep-sea salmon collagen, Gynostemma pentaphyllum extract, grass green salicornia extract, natto fermented essence, oat β-glucose Add polysaccharide, carbomer, sodium hyaluronate and methyl paraben into the stirring pot, start stirring and heat to 80°C, and stir until the above components are completely dissolved;

[0041] (2) Continue stirring until the temperatu...

Embodiment 2

[0044] Embodiment 2, moisturizing mask liquid of the present invention and preparation thereof

[0045] Formula: by weight percentage, water 83.35%, glycerin 2%, propylene glycol 5%, polyglycerol-10 2%, hydroxyethyl urea 3%, snail fluid 0.2%, deep-sea salmon collagen 1%, Jiaogulan extract 0.2% , Grass green salicornia extract 1%, natto fermented essence 0.2%, oat β-glucan 1%, carbomer 0.3%, triethanolamine 0.02%, sodium hyaluronate 0.05%, methylparaben 0.3% , 0.3% phenoxyethanol and 0.08% essence.

[0046] Preparation: (1) Water, glycerin, propylene glycol, polyglycerol-10, hydroxyethyl urea, snail liquid, deep-sea salmon collagen, Gynostemma pentaphyllum extract, grass green salicornia extract, natto fermented essence, oat β-glucose Add polysaccharide, carbomer, sodium hyaluronate and methylparaben into the stirring pot, start stirring and heat to 78°C, stir until the above components are completely dissolved;

[0047] (2) Continue stirring until the temperature drops to ...

Embodiment 3

[0050] Embodiment 3, moisturizing mask liquid of the present invention and preparation thereof

[0051] Formula: by weight percentage, water 82.16%, glycerin 5%, propylene glycol 2%, polyglycerol-10 5%, hydroxyethyl urea 1%, snail liquid 1%, deep-sea salmon collagen 0.2%, Gynostemma pentaphyllum extract 1% , Grass green salicornia extract 0.2%, fermented natto essence 1%, oat β-glucan 0.2%, carbomer 0.05%, triethanolamine 0.3%, sodium hyaluronate 0.01%, methylparaben 0.05% , 0.8% phenoxyethanol and 0.03% essence.

[0052] Preparation: (1) Water, glycerin, propylene glycol, polyglycerol-10, hydroxyethyl urea, snail liquid, deep-sea salmon collagen, Gynostemma pentaphyllum extract, grass green salicornia extract, natto fermented essence, oat β-glucose Add polysaccharide, carbomer, sodium hyaluronate and methylparaben into the stirring pot, start stirring and heat to 82°C, stir until the above components are completely dissolved;

[0053] (2) Continue stirring until the tempe...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides moisturizing mask liquid and a preparation method thereof. The moisturizing mask liquid comprises water, glycerol, propylene glycol, polyglycerol-10, hydroxyethylurea, snail liquid, deep-sea salmon collagen, gynostemma pentaphylla extracts, grass green salicornia herbacea extracts, natto fermentation essence, oat beta-glucan, carboxgpolmethylene, triethanolamine, sodium hyaluronate, methylparaben, phenoxyethanol and essence. The moisturizing mask liquid has the advantages that the moisturizing mask liquid is high in moisturizing effect and rich in nutrition and can be easily absorbed by the skin of a user, the skin of the user can be sufficiently moisturized, the skin of the user is allowed to be moist, tender and glossy, and the skin of the user can be effectively kept moist all day long.

Description

technical field [0001] The invention belongs to the technical field of cosmetics, and in particular relates to a moisturizing mask liquid and a preparation method thereof. Background technique [0002] In the past, ultraviolet radiation was the biggest source of damage to our skin, and now environmental pollution is the second biggest cause of skin problems, which can lead to dryness, irritation, allergies, and various skin conditions. [0003] Environmental pollution includes 1. Physical invasion (dust, smog, sandstorm, PM2.5, computer radiation): PM2.5 diameter is smaller than pores and enters the skin, causing skin dehydration, sensitivity, oil secretion imbalance, aging, and blackheads, pores Gross question. 2. Chemical attack (second-hand smoke, car exhaust, industrial pollution, exhaust gas, etc.): In addition to increasing free radicals, it will also promote the disintegration of collagen and reduce microcirculation, resulting in sagging, dry, and dull skin. [0004...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/98A61K8/97A61K8/73A61K8/65A61Q19/00
Inventor 李红军陈坚生
Owner 广州科玛生物科技股份有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products