Inverted pyramid structure of polysilicon surface and fabrication method of inverted pyramid structure
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 江苏辉伦太阳能科技有限公司
- Publication Date
- 2015-11-11
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention belongs to the technical field of solar cells, in particular to an inverted pyramid structure on the surface of polycrystalline silicon and a preparation method thereof. Background technique
[0002] Conventional polysilicon textured surfaces are all micron-scale worm-like structures. Polycrystalline silicon textured surfaces are made by utilizing the anisotropic properties of silicon, and using acid corrosion to form a honeycomb structure on the surface, which has a certain light trapping effect and can reduce the surface of the silicon wafer. Reflectivity.
[0003] There is also a new nano-light-trapping structure, which is generally called "black silicon", which has a good The light trapping effect can significantly reduce the reflectivity of the silicon wafer surface, and is considered to be a structure that can effectively improve the conversion efficiency of solar cells. At present, there are many laboratories that can prepare bla...