Liquid photo-imageable electrostatic-spraying solder mask and preparation and spraying methods thereof
An electrostatic spraying and solder resist technology, applied in the field of liquid photosensitive solder resist materials for PCB boards, can solve problems such as instability, inconsistency of screen printing production conditions, and environmental pollution, and achieve high insulation, excellent resolution, and wide The effect of operating range
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0030] Photosensitive resin preparation method is:
[0031] (1) Add 210 parts of o-cresol novolac epoxy resin into the reaction kettle, add 100 parts of dibasic ester solvent, and heat to dissolve at a temperature of 83-86°C;
[0032] (2) Add 0.1 part of p-hydroxyanisole, 1.5 parts of triphenylphosphine, slowly drop into 72 parts of refined acrylic acid, heat the mixture to 95-105°C, fully react for 8 hours, and cool the reactant to 90°C;
[0033] (3) Add 101 parts of tetrahydrophthalic anhydride, 110 parts of tetramethylbenzene, and 48 parts of dibasic acid ester, keep the temperature condition of 90-95°C for 4 hours, and obtain a polymer with a solid content of 60%, and the acid value formed by the solid content The temperature is 74mgKOH / g, the temperature of the reactant is lowered to 50°C, and the material is discharged to obtain the photosensitive resin.
Embodiment 2
[0035] The preparation process of the main ingredient: 420g of the photosensitive resin prepared in Example 1, 6g of phthalocyanine green, 16g of melamine (99.9% in content), 9g of photoinitiator (ITX3g, TPO3g, EDB3g), 35g of photosensitizer, silane coupling agent Mix 2g, curing accelerator 0.08g, surface treatment agent 18g, defoamer 6g, talcum powder 20g, barium sulfate 190g, divalent ester solvent 14g, tetramethylbenzene 14g, use a high-speed disperser at a speed of 500RPM, and stir for 40 minutes , and then use a three-roll mill to grind to a fineness of less than 15 μm, then filter to remove mechanical impurities, and finally adjust the viscosity to 180dpa.s, that is, the main agent. The photosensitizer is Irgacure907, the silane coupling agent is A-172, the curing accelerator is 2MA-OK, the defoamer is Shin-Etsu 750-S, and the surface treatment agent is mixed and dispersed with 12 parts of organosilicon bentonite and 6 parts of tetramethylbenzene Obtained after ripening....
Embodiment 3
[0037] The preparation process of the main agent: 450g of the photosensitive resin prepared in Example 1, 6g of phthalocyanine green, 16g of melamine, 9g of photoinitiator (ITX3g, TPO3g, EDB3g), 35g of photosensitizer, 2g of silane coupling agent, 0.08 of curing accelerator g. Mix 18g surface treatment agent, 6g defoamer, 20g talcum powder, 160g barium sulfate, 14g dibasic ester solvent, and 14g tetramethylbenzene, use a high-speed disperser at a speed of 500RPM, stir for 40 minutes, and then grind with three rollers Grind with a machine until the fineness is less than 15μm, then filter to remove mechanical impurities, and finally adjust the viscosity to 180dpa.s, which is the main agent. The photosensitizer is Irgacure907, the silane coupling agent is A-172, the curing accelerator is 2MA-OK, and the defoamer is Shin-Etsu KS-66.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com