Solder-resisting photosensitive resin composition, printed wiring board and preparation technology of printed wiring board
A technology for printed circuit boards and photosensitive resins, which is applied in the photoengraving process of pattern surface, printed circuit, printed circuit manufacturing, etc. There are problems such as air bubbles and poor solder mask performance, achieving good exposure performance and thickness uniformity, shortening exposure time, and good mechanical properties.
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Example Embodiment
[0033] Example 1
[0034] 1. Make solder mask photosensitive film
[0035] Such as figure 1 As shown, the prepared solder resist photosensitive dry film is composed of a three-layer structure of PE film 1, solder resist photosensitive dry film 2 and PET film 3. The specific manufacturing process is as follows:
[0036] a, weighing
[0037] Binder (polystyrene resin 10g, polystyrene resin 2g), epoxy resin (urethane modified epoxy resin 32g), monomer (pentaerythritol triacrylate 13g), photoinitiator (xylene ketone 13g), Additives (5g of phenylproprazole, 5g of triethylene glycol diacetate, 9g of polypropylene, 7g of ethylene (approximately equivalent to 5.6L)), dye (4g of malachite green).
[0038] b. Premix polystyrene, polystyrene resin, pentaerythritol triacrylate, dimethyl ketone, phenylproprazole, triethylene glycol diacetate, and polypropylene, and then add them to the polyurethane modified epoxy resin , The mixture is obtained, and then the mixture is shaken and stirred while dis...
Example Embodiment
[0055] Experimental example:
[0056] The performance of the dry film solder resist layer of the circuit boards prepared in Example 1 and Comparative Example 1 was tested and compared. The results are shown in Table 2 below:
[0057]
[0058] It can be seen from the comparison of the test item data in Table 2 that the solder mask formed by the UV curing method of the dry film of the present invention is superior to the thermal curing effect in terms of film thickness uniformity, resolution, and hardness.
Example Embodiment
[0059] Example 2
[0060] Compared with Example 1, the coating thickness in step c is 15 μm, and other conditions remain unchanged.
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