Modified metal polishing solution

A polishing liquid and modification technology, applied in the field of metal polishing liquid, can solve the problems of poor brightness, short gloss retention time, and large environmental pollution.

Inactive Publication Date: 2016-05-11
繁昌县陈氏金属制品有限公司
View PDF0 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The leveling of mechanical polishing is good, but its labor intensity is high and the gloss retention time is not long, so it is only suitable for metal workpieces with simple structure; although the effect of electrochemical polishing is good, the cost is too high; the existing chemical polishing liquid can be It is di...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] A kind of modified metal polishing liquid that the present invention proposes, its raw material comprises by weight: 100 parts of modified polyethylene waxes, 40 parts of sodium oleate, 25 parts of citric acid, 10 parts of sodium tripolyphosphate, 5 parts of diethanolamine, 3.5 parts of ethanolamine, 4 parts of lauroyl diethanolamine, 2.5 parts of hydroxypropyl cellulose, 6 parts of diethylene glycol monomethyl ether, 6 parts of polyoxypropylene polyoxyethylene propylene glycol ether, 4.5 parts of quartz sand, 4.5 parts of nano-alumina , 3 parts of gelatin, 4 parts of methionine, 5.5 parts of citric acid, 2.5 parts of trialkylamine, 2.5 parts of sodium alkylbenzene sulfonate, 4 parts of glucose, 3 parts of sodium silicate, 6 parts of citrate, 30 parts of deionized water share.

[0015] The modified polyethylene wax is prepared according to the following process: 10 parts of maleic anhydride, 4 parts of initiator BPO and 6 parts of acetone are mixed uniformly by weight t...

Embodiment 2

[0017] A kind of modified metal polishing liquid that the present invention proposes, its raw material comprises by weight: 80 parts of modified polyethylene waxes, 60 parts of sodium oleate, 15 parts of citric acid, 15 parts of sodium tripolyphosphate, 2 parts of diethanolamine, 6 parts of ethanolamine, 2 parts of lauroyl diethanolamine, 4 parts of hydroxypropyl cellulose, 3 parts of diethylene glycol monomethyl ether, 8 parts of polyoxypropylene polyoxyethylene propylene glycol ether, 1 part of quartz sand, 7 parts of nano-alumina , 1 part of gelatin, 6 parts of methionine, 3 parts of citric acid, 4 parts of trialkylamine, 1 part of sodium alkylbenzene sulfonate, 6 parts of glucose, 1 part of sodium silicate, 8 parts of citrate, 20 parts of deionized water share.

[0018] The modified polyethylene wax is prepared according to the following process: by weight, 5 parts of maleic anhydride, 6 parts of initiator BPO and 3 parts of acetone are mixed uniformly to obtain material a...

Embodiment 3

[0020] A kind of modified metal polishing liquid that the present invention proposes, its raw material comprises by weight: 120 parts of modified polyethylene waxes, 20 parts of sodium oleate, 35 parts of citric acid, 5 parts of sodium tripolyphosphate, 8 parts of diethanolamine, 1 part of ethanolamine, 6 parts of lauroyl diethanolamine, 1 part of hydroxypropyl cellulose, 9 parts of diethylene glycol monomethyl ether, 4 parts of polyoxypropylene polyoxyethylene propylene glycol ether, 8 parts of quartz sand, 2 parts of nano-alumina , 5 parts of gelatin, 2 parts of methionine, 8 parts of citric acid, 1 part of trialkylamine, 4 parts of sodium alkylbenzene sulfonate, 2 parts of glucose, 5 parts of sodium silicate, 4 parts of citrate, 40 parts of deionized water share.

[0021] The modified polyethylene wax is prepared according to the following process: 15 parts of maleic anhydride, 2 parts of initiator BPO and 9 parts of acetone are mixed uniformly by weight to obtain material ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a modified metal polishing solution. The modified metal polishing solution is prepared from modified polyethylene wax, sodium oleate, citric acid, sodium tripolyphosphate, diethanol amine, ethanol amine, lauryl diethanolamine, hydroxy propyl cellulose, diethylene glycol monomethyl ether, polypropylene oxide polyoxyethylene propylene propylene glycol ether, quartz sand, nanometer aluminum oxide, gelatin, methionine, trialkylamine, sodium alkyl benzene sulfonate, glucose, sodium silicate, citrate and deionized water. The modified metal polishing solution is high in polishing efficiency, good in stability and good in corrosion resisting and wear resisting performance.

Description

technical field [0001] The invention relates to a metal polishing liquid, in particular to a modified metal polishing liquid. Background technique [0002] At present, metal products often have burrs or a layer of gray oxide film on the surface after processing, which affects their appearance and corrosion resistance. After finishing (polishing) the surface, the surface finish and corrosion resistance can be greatly improved. At present, there are three common polishing methods: mechanical polishing, chemical polishing, and electrochemical polishing. The leveling of mechanical polishing is good, but its labor intensity is high and the gloss retention time is not long, so it is only suitable for metal workpieces with simple structure; although the effect of electrochemical polishing is good, the cost is too high; the existing chemical polishing liquid can be It is divided into aqua regia type, sulfuric acid type and phosphoric acid type, etc. The use of chemical polishing h...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23F3/00
CPCC23F3/00
Inventor 戴巧子
Owner 繁昌县陈氏金属制品有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap