Efficient and environment-friendly film-stripping solution capable of keeping copper surface bright and concentrated solution of film-stripping solution

Abstract

The invention discloses an efficient and environment-friendly film-stripping solution capable of keeping a copper surface bright. The film-stripping solution comprises sodium hydroxide and / or potassium hydroxide; the film-stripping solution is characterized by comprising the following components in percentage by weight: 1-25% of sodium hydroxide and / or potassium hydroxide, 0.01-12% of a component which is selected from one or more of hydrazine hydrate, hydroxylamine hydrochloride, hydroxylamine sulphate, sodium sulfite, sodium thiosulfate or potassium iodide, and the balance of water; and the film-stripping solution also can be prepared into a film-stripping condensated solution, including the following components in percentage by weight: 25-40% of sodium hydroxide and / or potassium hydroxide, 0.02-20% of a component which is selected from one or more of hydrazine hydrate, hydroxylamine hydrochloride, hydroxylamine sulphate, sodium sulfite, sodium thiosulfate or potassium iodide, and the balance of water. The film-stripping solution is high in film-stripping speed and capable of preventing from blackening the copper surface in the film-stripping process, without etching the copper surface; and in addition, the film-stripping solution can reach the standard for emission without causing pollution to the natural water body.

Description

technical field [0001] The invention relates to a stripping solution, in particular to a stripping solution and a concentrated solution thereof which are highly efficient, can keep the copper surface bright and are environmentally friendly. Background technique [0002] Photoresist is a corrosion-resistant film material commonly used in the production process of printed circuit boards, and its main components are photopolymers and adhesive polymers. In the manufacture of printed circuit boards, the photoresist is usually covered on the treated copper clad board, and then cured and developed by exposure reaction to form a certain circuit image, and etching is carried out according to the circuit image. The curing imaging process of photoresist is subdivided into positive film and negative film process according to the specific production requirements, and the film stripping process before etching and the film stripping process after etching are taken accordingly. The princip...

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Problems solved by technology

However, not only the production cost of the organic defilming solution is relatively high, but also the organic components in the defilming waste liquid are likely to cause the chemical oxygen demand (COD) of the defilming waste liquid to be too high even after sewage treatment; if it is directly discharged into natural water bodies In the middle, it will greatly reduce the reoxygenation capacity of the natural water body, causing the water body to gradually become anaerobic, causing the deterioration of water quality and destroying the aquatic ecosystem

[0018] To sum up, the existing defilming solutions are difficult to simultaneously achieve high-efficiency defilming, anti-blackening of the copper surface, and meet the requirements of environmental protection and emission.

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