Low-temperature low-pressure preparation method of boron nitride coating
A low-temperature, low-pressure, boron nitride technology, applied in coating, metal material coating process, gaseous chemical plating, etc. Fast speed and other issues, to achieve the effect of easy control, improved mechanical properties, uniform and controllable thickness
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[0022] Example one:
[0023] In this embodiment, see figure 1 , A method for preparing boron nitride coating at low temperature and low pressure, including the following steps:
[0024] (1) Clean the graphite plate to remove surface dust and other pollutants, and put it into the deposition furnace after drying;
[0025] (2) Vacuum the deposition furnace, fill it with high-purity nitrogen, and repeat the cycle five times to remove the air in the deposition furnace;
[0026] (3) Fill with high-purity nitrogen and heat up to 400℃;
[0027] (4) After the temperature stabilizes, introduce carrier gas nitrogen, carrier gas flow rate 100ml / min, and introduce reaction gas boron trichloride and ammonia gas, of which boron trichloride flow rate is 20ml / min, ammonia flow rate is 60ml / min, and the system is maintained Vacuum degree 10mbar, deposition time 5h;
[0028] (5) After the deposition is over, stop the introduction of boron trichloride and ammonia, reduce the nitrogen flow rate to 20ml / min...
Example Embodiment
[0032] Embodiment two:
[0033] This embodiment is basically the same as the first embodiment, and the special features are:
[0034] In this embodiment, a method for preparing a boron nitride coating at low temperature and low pressure includes the following steps:
[0035] (1) Clean the carbon fiber bundle to remove surface dust and other pollutants, and put it into the deposition furnace after drying;
[0036] (2) This step is the same as the first embodiment;
[0037] (3) Fill with nitrogen and heat up to 500℃;
[0038] (4) After the temperature is stabilized, introduce carrier gas nitrogen, carrier gas flow rate 100ml / min, introduce reactant gases boron trichloride and ammonia gas, of which boron trichloride flow rate is 20ml / min, ammonia flow rate is 80ml / min, and the system is maintained Pressure 8mbar, deposition time 5h;
[0039] (5) After the deposition is over, stop the introduction of boron trichloride and ammonia, reduce the nitrogen flow rate to 20ml / min, quickly increase ...
Example Embodiment
[0041] Embodiment three:
[0042] This embodiment is basically the same as the previous embodiment, and the special features are:
[0043] In this embodiment, see figure 2 , A method for preparing boron nitride coating at low temperature and low pressure, including the following steps:
[0044] (1) Clean 2D-silicon carbide to remove surface dust and other pollutants, and put it into the deposition furnace after drying;
[0045] (2) Vacuum the deposition furnace, fill it with argon, and repeat the cycle five times to remove the air in the deposition furnace;
[0046] (3) Fill with argon gas and heat up to 600℃;
[0047] (4) After the temperature stabilizes, introduce the carrier gas argon, the carrier gas flow rate is 100ml / min, the catalytic gas hydrogen, and the reaction gas boron trichloride and ammonia gas, of which the boron trichloride flow rate is 20ml / min and the ammonia flow rate is 100ml / min, hydrogen flow rate is 20ml / min, the system maintains a pressure of 20mbar, and the ...
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