A method of laser surface remelting and chemical dealloying combined to prepare micro-nano structured bulk silicon materials

Abstract

The invention discloses a method for preparing a micro-nano structure bulk silicon material through the laser surface remelting and chemically de-alloying and compounding process. The method is characterized in that, firstly, the surface remelting treatment is conducted on the aluminum-silicon alloy by using the laser; secondly, a surface remelting layer is cut off; finally, the remelting layer is subjected to the de-alloying treatment by using a corrodent to remove the element aluminum. In this way, the micro-nano structure bulk silicon material is finally obtained as shown in figure 1. The method has the advantages of simple operation, short period and high efficiency. The method can be carried out at a normal temperature. The prepared bulk silicon material can be applied to the fields of solar cells, lithium ion cells, biology and the like.

Description

technical field [0001] The invention belongs to the technical field of material preparation, and relates to a method for preparing a micro-nano structure block silicon material by using an aluminum-silicon alloy as a raw material. Specifically, a laser is used to remelt the surface of an aluminum-silicon alloy, and the aluminum element in the remelted layer is dissolved by chemical dealloying to prepare a micro-nano structured bulk silicon material. Background technique [0002] Micro-nano silicon materials are widely used in solar cells, biosensors, light-emitting devices, and lithium-ion batteries due to their characteristics of large surface area, good permeability, low thermal conductivity, strong adsorption, and high chemical activity. At present, the preparation methods of micro-nano silicon materials mainly include: (1) CVD deposition method, which usually uses silane as a raw material to prepare micro-nano silicon materials by vapor phase deposition. This method has ...

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Problems solved by technology

At present, the preparation methods of micro-nano silicon materials mainly include: (1) CVD deposition method, usually using silane as raw material to prepare micro-nano silicon materials by vapor phase deposition method, this method has complicated equipment, high cost and slow deposition rate

(2) electrochemical corrosion method, with silicon chip as anode, HF is electrolytic solution, silicon chip is corroded under the condition of applied electric current, prepares micronano silicon material, and electrochemical corrosion method parameter is difficult to control, and repetition rate is low, and low efficiency

(3) Magnesia thermal reduction method, using Mg to reduce silicon dioxide under high temperature conditions to obtain micro-nano silicon structure, this method needs to be carried out at high temperature, and the structure of micro-nano silicon is not easy to control

(4) The chemical etching method is a method in which silicon is immersed in an HF acid-based etching solution to etch and prepare micro-nano silicon materials. This method is simple and convenient, but the prepared micro-nano silicon has poor uniformity, low efficiency, and poor repeatability.

However, using aluminum-silicon alloys as raw materials, laser remelting, and chemical dealloying to remove aluminum elements to prepare micro-nano structured bulk silicon materials has not yet been involved.

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