Method for industrialized mass production of silicon carbide powder
A silicon carbide powder, a large-scale technology, applied in chemical instruments and methods, carbon compounds, inorganic chemistry, etc., can solve problems such as affecting the use of powder and interfering with product purity, and achieve low pollution, high purity, and low energy consumption. Effect
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Embodiment 1
[0041] SiCl 4 with H 2 Mix at a molar ratio of 1:2.2, and react at 1200°C to obtain 4N high-purity Si powder; put ethylene glycol in N 2 High-temperature carbonization under protected conditions to obtain 4N high-purity C powder. Si powder and C powder are mixed and hydrolyzed, and the slurry is granulated and dried at 200°C, and carbonized at 600°C to obtain uniformly mixed SiO 2 Mix with powder C.
[0042] Pre-burn in a high-temperature furnace at 500-600 °C until the water vapor content drops to a level that cannot be detected by the instrument, and then in N 2 Grind evenly under protection. Then carry out medium temperature synthesis at 1400~1900°C. After the reaction, use 1900°C high-temperature vacuum distillation to remove impurities.
[0043] The obtained product is subjected to particle size analysis with a laser particle size analyzer, and the average particle size d 50 Distributed in 4 ~ 20μm. Using ICP-MS for elemental analysis, the Si content in the high-p...
Embodiment 2
[0045] SiHCl 3 with H 2 Mix at a molar ratio of 1:1.2 and react at 1100°C to obtain 4N high-purity Si powder; 2 High-temperature carbonization under protected conditions to obtain 4N high-purity C powder. After Si powder and C powder are mixed and hydrolyzed, the slurry is granulated and dried at 240°C, and carbonized at 600°C to obtain uniformly mixed SiO 2 Mix with powder C.
[0046] Pre-burn in a high-temperature furnace at 500-600 °C until the water vapor content drops to a level that cannot be detected by the instrument, and then in N 2 Grind evenly under protection. Then carry out medium temperature synthesis at 1400~1900°C. After the reaction, use 2000°C high-temperature vacuum distillation to remove impurities.
[0047] The obtained product is subjected to particle size analysis with a laser particle size analyzer, and the average particle size d 50 Distributed in 4 ~ 20μm. Using ICP-MS for elemental analysis, the Si content in the high-purity Si powder reaches...
Embodiment 3
[0049] SiI 4 with H 2 Mix at a molar ratio of 1:2.2 and react at 1200°C to obtain 4N high-purity Si powder; 2 High-temperature carbonization under protected conditions to obtain 4N high-purity C powder. After Si powder and C powder are mixed and hydrolyzed, the slurry is granulated and dried at 250°C, and carbonized at 550°C to obtain uniformly mixed SiO 2 Mix with powder C.
[0050] Pre-burn in a high-temperature furnace at 500-600 °C until the water vapor content drops to a level that cannot be detected by the instrument, and then in N 2 Grind evenly under protection. Then carry out medium temperature synthesis at 1400~1900°C. After the reaction, use 2100°C high-temperature vacuum distillation to remove impurities, and finally carry out directional condensation segregation purification.
[0051] The obtained product is subjected to particle size analysis with a laser particle size analyzer, and the average particle size d 50 Distributed in 4 ~ 20μm. Using ICP-MS for ...
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