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A kind of reduced graphene oxide/mesoporous graphitized carbon nitride material and its preparation method

A graphene and graphitization technology, applied in the field of photocatalytic materials, can solve problems such as difficulty, photo-generated charge recombination, limited use, etc., and achieve the effects of simple synthesis method, improved catalytic performance, and simple and efficient preparation method.

Active Publication Date: 2019-03-22
CHINA UNIV OF PETROLEUM (BEIJING)
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the preparation of mpg-C by the soft template method 3 N 4 It has the advantages of simple process and economical steps, but the selection of surfactant and solvent in the synthesis process, and the control of roasting conditions have a great impact on mpg-C 3 N 4 The performance of all there is bigger influence, therefore, preparation high-performance mpg-C 3 N 4 not easy
Also, since g-C 3 N 4 There is a serious problem with the recombination of photogenerated charges, which also limits its use, especially in the application of photocatalytic degradation of organic matter

Method used

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  • A kind of reduced graphene oxide/mesoporous graphitized carbon nitride material and its preparation method
  • A kind of reduced graphene oxide/mesoporous graphitized carbon nitride material and its preparation method
  • A kind of reduced graphene oxide/mesoporous graphitized carbon nitride material and its preparation method

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Embodiment 1

[0043] This embodiment provides a reduced graphene oxide / mesoporous graphitized carbon nitride material, and a method for preparing the material (see the schematic diagram of the preparation process in figure 1 ) includes the following steps:

[0044] (1) Dissolve 0.5g of cetyltrimethylammonium bromide in 18mL of deionized water, add 6.8mL of ammonia water and 7mL of ethanol and mix well, then add 0.15g of melamine and 10mg of graphene oxide (pre-dispersed in 10mL to Ionized water); the resulting mixture was stirred at room temperature for 30 min, then volatilized at 55° C. to induce self-assembly for 5 h, and mesoscopic S-P-GO-1 ternary supramolecular aggregates were obtained.

[0045] (2) The above-mentioned mesoscopic S-P-GO-1 ternary supramolecular aggregates were heated to 350 °C at a rate of 2 °C / min in a nitrogen atmosphere, and then to 550 °C at a rate of 5 °C / min. Keep at this temperature for 2h to obtain reduced graphene oxide / mesoporous graphitized carbon nitride m...

Embodiment 2

[0071] The present embodiment provides a reduced graphene oxide / mesoporous graphitized carbon nitride material, and the method for preparing the material comprises the following steps:

[0072] (1) Dissolve 0.3g of cetyltrimethylammonium bromide and 0.5g of cetyltrimethylammonium chloride in 18mL of deionized water, add 6.8mL of ammonia water and 7mL of ethanol and mix well, then add 0.5 g cyanamide, 50mg graphene oxide (pre-dispersed in 10mL water); the resulting mixture was stirred at room temperature for 60min, then volatilized at 40°C to induce self-assembly for 24h, to obtain mesoscopic S-P-GO-2 ternary supramolecular aggregates;

[0073] (2) The above-mentioned mesoscopic S-P-GO-2 ternary supramolecular aggregates were heated to 380 °C at a rate of 4 °C / min in a nitrogen atmosphere, and then to 600 °C at a rate of 5 °C / min. Keep at this temperature for 4h to obtain reduced graphene oxide / mesoporous graphitized carbon nitride material, rGO / mpg-C 3 N 4 -2.

[0074] Prod...

Embodiment 3

[0078] The present embodiment provides a reduced graphene oxide / mesoporous graphitized carbon nitride material, and the method for preparing the material comprises the following steps:

[0079] (1) Dissolve 0.3g of cetyltrimethylammonium bromide and 0.2g of octadecyltrimethylammonium chloride in 18mL of deionized water, add 6.8mL of ammonia water and 7mL of isopropanol, mix well, and then Add 0.2g of dicyandiamide and 20mg of graphene oxide (pre-dispersed in 20mL of water); the resulting mixture was stirred at room temperature for 30min, then volatilized at 45°C to induce self-assembly for 15h, and the mesoscopic S-P-GO-3 ternary supramolecule was obtained Aggregates;

[0080] (2) The above-mentioned mesoscopic S-P-GO-3 ternary supramolecular aggregates were heated to 400 °C at a rate of 5 °C / min in a nitrogen atmosphere, and then to 550 °C at a rate of 10 °C / min. Keep at this temperature for 3h to obtain reduced graphene oxide / mesoporous graphitized carbon nitride material, ...

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Abstract

The invention provides a reduced graphene oxide / mesoporous graphitized carbon nitride material and a preparation method. The preparation method includes the following steps: (1) combining a cationic surfactant (S), a nitrogen-rich carbon source (P) and Graphene oxide (GO) is dispersed in an alkaline alcohol-water mixed solution, and then volatilized at low temperature (40-80°C) to induce self-assembly to obtain mesoscopic S-P-GO ternary supramolecular aggregates; (2) The mesoscopic S-P-GO ternary supramolecular aggregate is subjected to two-stage temperature-raising roasting to prepare reduced graphene oxide / mesoporous graphitized carbon nitride material. The above-mentioned preparation method of reduced graphene oxide / mesoporous graphitized carbon nitride materials is simple and efficient, and overcomes the current g-C 3 N 4 Catalytic-like materials have problems such as low specific surface area and fast photogenerated charge recombination, so they can significantly improve the catalytic performance in the degradation of organic dyes.

Description

technical field [0001] The invention belongs to the technical field of photocatalytic materials, in particular to a reduced graphene oxide / mesoporous graphitized carbon nitride material and a preparation method. Background technique [0002] With the rapid growth of population and the continuous advancement of industrialization, the discharge of organic pollutants is increasing day by day, and the damage to the environment, especially water resources, is becoming more and more serious. Traditional wastewater treatment methods such as biological and physical methods can only reduce the concentration of organic matter, but cannot eradicate organic pollutants in water. Therefore, it is urgent to find a new process that can degrade organic pollutants into non-pollutants. Semiconductor photocatalysis can use abundant solar energy to degrade organic pollutants in wastewater into non-toxic and non-polluting inorganic substances such as water and carbon dioxide, without causing sec...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01J27/24C02F1/30
CPCC02F1/30B01J27/24C02F2101/308C02F2305/10B01J35/613B01J35/39B01J35/635B01J35/633B01J35/647B01J35/615Y02W10/37
Inventor 杨英赵海瑞李伟曾德红
Owner CHINA UNIV OF PETROLEUM (BEIJING)