Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Super-hydrophobic microstructure and manufacturing method thereof

A super-hydrophobic micro-structure technology, applied in the field of materials, can solve problems such as not reaching the super-hydrophobic standard

Inactive Publication Date: 2017-06-09
SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
View PDF5 Cites 17 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Although the above two methods make the DLC film have a certain degree of hydrophobicity (contact angle > 90°), they still do not reach the standard of superhydrophobicity (contact angle > 150°).

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] 1) Hydrophilic treatment of silicon substrate

[0040] (1) Cut the silicon wafer into 10mm*20mm size.

[0041] (2) The conditions of organic cleaning are: acetone ultrasonic cleaning for 5-15 minutes, absolute ethanol ultrasonic cleaning for 5-15 minutes, and deionized water ultrasonic cleaning for 5-15 minutes.

[0042] (3) Concentrated sulfuric acid and hydrogen peroxide were mixed in a volume ratio of 3:1, heated continuously at 85°C for 60 minutes, and finally rinsed with deionized water.

[0043] 2) Using a gas-liquid interface assembly method to complete the self-assembly of a polystyrene ball with a diameter of 2000 nm on the silicon surface to form a single-layer polystyrene ball mask.

[0044] 3) Using inductively coupled plasma to etch the colloidal crystal grain mask. The etching conditions are: SF 6 The flow rate is 60sccm, O 2 The flow rate is 5sccm, C 4 F 8 The flow rate is 80sccm, the ICP power is 800W, the RF power is 35W, the etching temperature is 10°C, the cha...

Embodiment 2

[0050] 1) Hydrophilic treatment of silicon substrate

[0051] (1) Cut the silicon wafer into 20mm*20mm size.

[0052] (2) The conditions of organic cleaning are: acetone ultrasonic cleaning for 5-15 minutes, absolute ethanol ultrasonic cleaning for 5-15 minutes, and deionized water ultrasonic cleaning for 5-15 minutes.

[0053] (3) Concentrated sulfuric acid and hydrogen peroxide were mixed in a volume ratio of 3:1, heated continuously at 85°C for 60 minutes, and finally rinsed with deionized water.

[0054] 2) The self-assembly of polystyrene balls with a diameter of 500 nm on the silicon surface is completed by the natural sedimentation method to form a single-layer polystyrene ball mask.

[0055] 3) Using BOSCH process in inductively coupled plasma etching to etch the colloidal crystal grain mask. The etching conditions are: SF 6 The flow rate is 150sccm, O 2 The flow rate is 30sccm, the time is 6s; the passivation condition is: C 4 F 8 The flow rate is 50sccm, the time is 5s, the I...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Diameteraaaaaaaaaa
Login to View More

Abstract

The invention discloses a super-hydrophobic microstructure and a manufacturing method thereof. The method comprises: using colloid crystalline grains as an etching mask film, using a colloid crystalline grain etching technology to form nanoscale or micron grade microstructures on the surface of a silicon wafer; using ICP-PECVD to deposit fluorine-doped diamond film on the microstructures. The thickness of the diamond film is 1-100 nm, and mass proportion of fluorine in the diamond film is 1-50%. The colloid crystalline grain etching technology is used, and expensive optical equipment is not needed. Colloid crystalline grains in different grain diameters are used as the etching mask film, and micron and nano meter microstructures in different feature sizes are obtained. The ICP-PECVD is helpful to improve density of reactive plasma in a cavity and increase density of the fluorine-doped DLC film, so as to improve quality of the formed film. The ICP-PECVD can realize to deposit films at room temperature, and the DLC film can be formed on an organic polymer substrate which is not resistant to high temperature, and the DLC film has hydrophobic property.

Description

Technical field [0001] The invention belongs to the technical field of materials, and particularly relates to a superhydrophobic microstructure and a preparation method thereof. Background technique [0002] In 1977, German botanists Barthlott and Neinhuis discovered the lotus effect. When the micron epidermal cells and nano biowax material on the surface of the lotus leaf make the water droplets on the surface of the lotus leaf, the surface of the lotus leaf and the water droplets have a fixed water contact angle of 150° and a water droplet rolling angle of 10°. The surface of the lotus leaf has super-hydrophobic properties and self-cleaning function. [0003] Based on the water-repellent and self-cleaning effect of lotus leaf, the super-hydrophobic / super-oleophobic surface based on bionics has become a current research hotspot. When preparing super-hydrophobic / super-oleophobic surfaces, firstly, there must be a low surface energy component to reduce the free energy of the mater...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B81B1/00B81C1/00B82B1/00B82B3/00B82Y40/00
Inventor 张建军李丰
Owner SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com