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A slurry suitable for aluminum nitride substrate and preparation method thereof

An aluminum nitride and paste technology, which is applied in the direction of heterogeneous insulating materials, metal oxides, plastic/resin/wax insulators, etc., can solve the problem of difficult to apply the use process of aluminum nitride substrates, and achieve excellent screen printing performance , the effect of low resistance

Inactive Publication Date: 2018-08-31
DONGGUAN COREHELM ELECTRONICS MATERIAL TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, under some conditions, it is necessary to coat the aluminum nitride material with a slurry coating containing ruthenium oxide, but when the temperature is above 750 ° C, aluminum nitride will chemically react with ruthenium oxide to release nitrogen. Therefore, the existing slurry coating containing ruthenium oxide The slurry of ruthenium oxide is difficult to apply to the process of using aluminum nitride substrates (around 850°C)

Method used

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  • A slurry suitable for aluminum nitride substrate and preparation method thereof
  • A slurry suitable for aluminum nitride substrate and preparation method thereof
  • A slurry suitable for aluminum nitride substrate and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Prepare the slurry suitable for aluminum nitride substrates according to the following steps.

[0026] Preparation of glass powder: by mass percentage, weigh 18-26% of analytically pure grade silicon dioxide, 45-58% of bismuth oxide, 10-15% of boron oxide, 14-20% of barium oxide, 3-6% After mixing the ferric oxide, transfer it to a corundum crucible or a platinum crucible, place it in a box-type resistance furnace and heat it up to 1100-1500°C to melt and keep it for 15-30 minutes, then quench the molten liquid with water to obtain glass frit, and then crush the glass frit And ball milled into glass powder with particle size within 10μm.

[0027] Prepare the organic phase: weigh 15-25% of terpineol, 20-30% of butyl carbitol, 30-50% of butyl carbitol acetate, 8-15% of phthalate Dibutyl diformate, 8-12% tributyl citrate and 4-8% ethyl cellulose are placed in a dispersion tank and stirred and dispersed for more than 4 hours to obtain a transparent organic solvent mixture....

Embodiment 2

[0034] According to mass percentage, weigh 40% of the glass powder prepared above, 33% of the above-mentioned organic solvent mixture, 3% of additives and 24% of ruthenium oxide powder with a purity greater than 99.9% and a particle size of less than 8 μm, and stir and three-roll grinding , Filtration and defoaming processes to obtain the required slurry.

Embodiment 3

[0036] According to mass percentage, weigh 38% of the above-mentioned prepared glass powder, 33% of the above-mentioned organic solvent mixture, 2% of additives and 27% of ruthenium oxide powder with a purity greater than 99.9% and a particle size of less than 8 μm, after stirring and three-roll grinding , Filtration and defoaming processes to obtain the required slurry.

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Abstract

The present invention discloses a slurry adaptive to an aluminum nitride base material and a preparation method thereof. The slurry comprises the following components of mass percents of 30-40% of glass powder, 24-42% of ruthenium oxide powder, 28-37% of organic solvent mixture and 1-3% of auxiliary, and the organic solvent mixture comprises terpilenol, butyl carbitol, butyl carbitol acetat, dibutyl phthalate, tri-n-butyl citrate and ethyl cellulose. The preparation method of the slurry is characterized by, according to the mass percents, obtaining the glass powder, the organic solvent mixture and the ruthenium oxide powder, and carrying out the stirring, three-roller grinding, filtering and deaeration processes to obtain the needed slurry. The slurry adaptive to the aluminum nitride base material of the present invention adopts the glass powder of a low softening point to support the selected organic solvent mixture, thereby being able to reduce the sintering temperature of the slurry. A sintered slurry layer has the excellent performances that the resistance is low, and the refiring resistance change rate is less than 3%. Meanwhile, the slurry does not contain the lead, has an excellent silkscreen performance, and is totally suitable for being used as a large-power density (greater than 80W / cm<2>) heating device.

Description

technical field [0001] The invention relates to a slurry, in particular to a slurry adapted to an aluminum nitride substrate and a preparation method thereof. Background technique [0002] Aluminum nitride has excellent thermal conductivity and electrical insulation properties, so it has become an important choice for emerging electric heating devices as substrates. Compared with the stainless steel substrate, the aluminum nitride material has obvious advantages. It can be used directly without covering the dielectric layer. The extremely high thermal conductivity means that the substrate can be heated evenly in a very short time. However, under some conditions, it is necessary to coat the aluminum nitride material with a slurry coating containing ruthenium oxide, but when the temperature is above 750 ° C, aluminum nitride will chemically react with ruthenium oxide to release nitrogen. Therefore, the existing slurry coating containing ruthenium oxide The slurry of ruthenium...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01B3/00H01B3/08H01B3/10H01B3/18H01B3/20H01B3/42H01B19/00
CPCH01B3/006H01B3/08H01B3/10H01B3/18H01B3/185H01B3/20H01B3/421H01B19/00
Inventor 廖玉超苏冠贤
Owner DONGGUAN COREHELM ELECTRONICS MATERIAL TECH CO LTD
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