Photovoltaic near and middle infrared double-color detector for Si-based three-dimensional Ge quantum dot crystal
A technology of two-color detectors and quantum dots, applied in photovoltaic power generation, semiconductor devices, electrical components, etc., can solve the problems of high material cost, difficult preparation, on-chip integration of photosensitive elements, etc., and achieve high detection rate, strong light absorption coefficient, The effect of improving overall performance
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[0032] The purpose of this embodiment is to prepare a three-dimensional Ge quantum dot crystal two-color detector whose response wavelength covers the near-middle infrared band on a Si substrate. The preparation of Ge quantum dot crystals is achieved by growing Ge quantum dot arrays ordered in three dimensions by molecular beam epitaxy on a Si(001) pattern substrate etched with two-dimensional ordered arrangements. The in-plane order of Ge quantum dots is realized by the positioning and growth of pre-etched nanopits, while the order in the vertical direction is realized by the strain self-alignment effect of Ge quantum dots during multilayer stack growth. The size of Ge quantum dots is regulated by optimizing the growth conditions. Near-neighbor strong coupling of in-plane Ge QDs is achieved by reducing the period of the nanopit. The strong coupling of Ge quantum dots in the vertical direction is achieved by reducing the thickness of the Si spacer layer between adjacent Ge qu...
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