Indium tin oxide transparent electrode-based opposed-contact photoconductive switch and fabrication method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- XIDIAN UNIV
- Publication Date
- 2017-06-30
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Abstract
Description
technical field
[0001] The invention belongs to the field of microelectronics, in particular to a transparent electrode different-surface photoconductive switch, which can be used as a switch in a high-speed and high-power pulse system.
[0002] technical background
[0003] In 1974, D.H.Auston of Bell Laboratories prepared the world's first silicon-based photoconductive switch, but due to the limitations of silicon materials, high-performance switches could not be obtained; in 1976, H.L.Chi of the University of Maryland prepared the first The first GaAs photoconductive switch, its performance is far superior to the silicon-based photoconductive switch, so in the following decades, the photoconductive switch of gallium arsenide has been relatively mature research. However, due to the unique Lock-on effect of the GaAs photoconductive switch, its application in a wider range is limited. With the maturity of the third-generation semiconductor silicon carbide material, it has gr...