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Preparation method for deep-layer curing type fixed abrasive polishing pad

A fixed abrasive, deep curing technology, applied in grinding/polishing equipment, grinding devices, manufacturing tools, etc., can solve the problems of poor light transmittance, affecting the performance of polishing pads, etc., to achieve full curing, improve uniformity The degree of curing, the effect of improving the curing rate

Active Publication Date: 2017-08-18
东莞市均新胜光电科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention: the surface layer of the polymer matrix of the traditional UV-cured fixed abrasive polishing pad is first cured, and the surface cured layer containing abrasive grains has poor light transmission due to the blocking of abrasive grains, and the ultraviolet light is not good. The ground penetrates the surface solidified layer to reach the deep layer of the matrix to trigger the curing reaction, which affects the performance of the polishing pad, and provides a preparation method for the deep solidified fixed abrasive polishing pad.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

example 1

[0017] First, mix 3-aminopropyltriethoxysilane and epoxy resin E-51 at a mass ratio of 1:8 and stir at room temperature for 25 minutes to obtain a resin mixture, then mix the resin at a volume ratio of 1:10 solution and acetone were stirred and mixed, and heated in a water bath at 45°C for 25 minutes to prepare a matrix mixed solution; in parts by weight, 45 parts of the prepared matrix mixed solution, 10 parts of zirconium n-propoxide, 5 parts of deionized water and Put 3 parts of iron triacetylacetonate in a three-necked flask, stir and mix for 10 minutes, adjust the pH to 5.5 with glacial acetic acid, and then heat in a water bath at 65°C for 6 hours, then filter to obtain the filtrate, and put the filtrate at 65°C and rotary evaporate to the original 1 / 5 of the volume, the modified spinning solution can be prepared; the modified spinning solution is collected and placed in the electrospinning device, the angle of the injector of the electrostatic spinning device is adjusted...

example 2

[0020] First, mix 3-aminopropyltriethoxysilane and epoxy resin E-51 at a mass ratio of 1:8 and stir at room temperature for 28 minutes to obtain a resin mixture, then mix the resin at a volume ratio of 1:10 solution and acetone were stirred and mixed, and heated in a water bath at 48°C for 28 minutes to prepare a matrix mixed solution; in parts by weight, 48 parts of the prepared matrix mixed solution, 13 parts of zirconium n-propoxide, 7 parts of deionized water and 4 parts of iron triacetylacetonate were placed in a three-necked flask, stirred and mixed for 13 minutes, adjusted to pH 5.8 with glacial acetic acid, heated in a water bath at 68°C for 7 hours, filtered to obtain the filtrate, and the filtrate was rotary evaporated at 68°C to the original 1 / 5 of the volume, the modified spinning solution can be prepared; the modified spinning solution is collected and placed in the electrospinning device, the angle of the injector of the electrostatic spinning device is adjusted t...

example 3

[0023] First, mix 3-aminopropyltriethoxysilane and epoxy resin E-51 at a mass ratio of 1:8 and stir at room temperature for 30 minutes to obtain a resin mixture, then mix the resin at a volume ratio of 1:10 solution and acetone were stirred and mixed, and heated in a water bath at 50°C for 30 minutes to prepare a matrix mixed solution; in parts by weight, 50 parts of the prepared matrix mixed solution, 15 parts of zirconium n-propoxide, 8 parts of deionized water and Put 5 parts of iron triacetylacetonate in a three-necked flask, stir and mix for 15 minutes, adjust the pH to 6.0 with glacial acetic acid, and then heat in a water bath at 70°C for 8 hours, then filter to obtain the filtrate, and place the filtrate at 70°C by rotary evaporation to the original 1 / 5 of the volume, the modified spinning solution can be prepared; the modified spinning solution is collected and placed in the electrospinning device, the angle of the injector of the electrostatic spinning device is adjus...

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Abstract

The invention relates to a preparation method for a fixed abrasive polishing pad, and belongs to the technical field of chemical-mechanical polishing dressing preparation. Zirconium propoxide solution serves as a precursor, composite epoxy resin and acetone serve as mediums, and after high-refractive fiber is prepared by electrostatic spinning, the high-refractive fiber and Sic abrasive grit are mixed and ball-milled and blend with other materials; and in the process of ultraviolet light polymerization, ultraviolet light penetrates into a deep layer of the fixed abrasive polishing pad to conduct ultraviolet curing under the influence of high-refractive materials, the curing rate and the homogeneous curing degree of the fixed abrasive polishing pad are effectively improved, and the using performance of the polishing pad is effectively improved. According to the preparation method for the fixed abrasive polishing pad, the hardness of a pencil in a dry state is 3-4 H, the hardness of a pencil in a hygrometric state is 3 H / 3-5 B, the swelling ratio is 2.67-3.56%, and a long service life and a high working efficiency are achieved.

Description

technical field [0001] The invention relates to a preparation method of a fixed abrasive polishing pad, and belongs to the technical field of chemical mechanical polishing dressing preparation. Background technique [0002] With the rapid development of industries such as semiconductors and optics, various types of hard and brittle difficult-to-process materials have been widely used in the fields of optics, electronics, and optical communications, such as crystals, optical glass, conductive glass, ceramics, gemstones, flat-panel displays, Light guide cameras, etc., and the processing requirements for the surface of these workpieces are also increasing. The above materials are mainly processed by traditional chemical mechanical grinding and polishing processing methods. The traditional chemical mechanical grinding and polishing process uses diamond, silicon carbide, silicon oxide, zirconia, cerium oxide, etc. as abrasives to micro-machine the workpiece to obtain a high-qual...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24D18/00
CPCB24D18/009
Inventor 高昕文王艳芹
Owner 东莞市均新胜光电科技有限公司
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