Super-hydrophobic surface reinforced Raman substrate prepared from silicon nanometer dielectric material and preparation method thereof
A technology of super-hydrophobic surface and Raman substrate, which is applied in nanotechnology, Raman scattering, nanotechnology, etc. for materials and surface science, and can solve the problem of mild reaction conditions, time-consuming and high cost, and unfavorable practical utilization, etc. problem, to achieve the effect of simple method, low cost, and changing the local distribution of the light field
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[0040] 1) Use n-type double-sided polished silicon wafers, cut into 2×2 cm 2 size, put them in acetone solution and alcohol solution and ultrasonically clean them for 15 min respectively;
[0041] 2) Then rinse the residual alcohol solution on the surface of the silicon wafer with deionized water, and ultrasonically clean it in deionized water for 15 minutes, then immerse the silicon wafer in a beaker filled with hydrogen peroxide and concentrated sulfuric acid and heat at 80 °C for 30 minutes to remove the residual alcohol solution on the surface. Organic pollutants, the volume ratio of the solution H 2 SO 4 :H 2 o 2 =3:1, finally take out the silicon wafer and dry it with a large amount of deionized nitrogen;
[0042] 3) Place the cleaned silicon wafer in a NaOH solution with a mass fraction of 20% and heat it in a water bath at 80 °C for 2 min, then quickly take it out and rinse it in deionized water;
[0043] 4) Then place the silicon wafer in a mixed solution of eth...
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