A polarization-sensitive uncooled infrared detector and its preparation method

An uncooled infrared and polarization-sensitive technology, applied in electric radiation detectors, radiation pyrometry, instruments, etc., can solve the problems of complex optical path system, complex optical components, and difficult design, so as to simplify the optical system and reduce optical Components, Difficulty Reducing Effects

Active Publication Date: 2019-04-30
YANTAI RAYTRON TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In the existing polarization detection system, the polarization element is independent of the detector, and it is necessary to add a polarizer to the lens of the whole machine, or to design a polarization lens. This method is relatively expensive and difficult to design; The polarization information is obtained by rotating the polarization element. The disadvantages of this existing polarization detection system are: the optical elements are complicated, and the optical path system is complicated
In addition, the polarization image collected through the combination of polarizer and detector needs to be processed by image fusion algorithm, which is not only complicated but also relatively inaccurate

Method used

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  • A polarization-sensitive uncooled infrared detector and its preparation method
  • A polarization-sensitive uncooled infrared detector and its preparation method
  • A polarization-sensitive uncooled infrared detector and its preparation method

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Embodiment 1

[0046] A method for preparing a polarization-sensitive uncooled infrared detector, comprising the steps of:

[0047] Step 1: Provide an existing uncooled infrared detector without structural release, deposit a second layer of sacrificial layer 10 and a grating support layer sequentially on the protective layer of the existing detector, and the grating support layer includes the first grating The supporting layer 11 and the second grating supporting layer 12 arranged on the first grating supporting layer 11, the first grating supporting layer 11 is a silicon nitride layer, the silicon nitride layer is deposited first, and then the silicon nitride layer is deposited A silicon oxide layer is deposited on it;

[0048] Step 2: Prepare a metal grating structure on the grating support layer. First, use physical vapor deposition or sputtering to deposit or sputter a layer of metal film on the support layer, and then use a dry etching process to etch the grating pattern, so that adjace...

Embodiment 2

[0051] The preparation method of the polarization-sensitive uncooled infrared detector is different from the first embodiment: in step 2, a metal grating structure is prepared on the grating support layer, and photoresist or PI is first spin-coated on the grating support layer. Photolithography technology obtains a grating pattern on the photoresist coating or PI coating, the grating interval is 10-500nm, and then deposits or sputters on the photoetched photoresist or PI coating by physical vapor deposition or sputtering The metal film, and finally, the photoresist or PI coating is removed using a stripping process, and the excess metal film is stripped. Step 1 and step 3 are the same as the preparation method in Example 1.

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Abstract

The invention relates to a polarization-sensitive uncooled infrared detector, comprising a first layer of suspended structure, the first layer of suspended structure is an existing uncooled infrared detector, and the first layer of suspended structure is provided with a second layer The suspended structure, the suspended structure of the second layer includes a grating support layer and a metal grating structure arranged on the support layer, which can simplify the optical system and improve the authenticity and effectiveness of the image; A method for preparing a refrigerated infrared detector, comprising the following steps: Step 1. Prepare a second sacrificial layer and a grating support layer on an existing uncooled infrared detector that has not undergone structure release; Step 2. Prepare a metal grating structure; Step 3 .The structure is released to form a polarization-sensitive uncooled infrared detector.

Description

technical field [0001] The invention relates to a polarization-sensitive uncooled infrared detector and a preparation method thereof, belonging to the field of micro-electro-mechanical system technology manufacturing. Background technique [0002] Micro-bolometer is a kind of heat detector based on the resistance value of the material with heat-sensitive characteristics changes correspondingly when the temperature changes. [0003] Uncooled infrared detection technology is a technology that senses the infrared radiation (IR) of external objects without a cooling system and converts it into an electrical signal that is processed and output on the display terminal. It can be widely used in many fields such as national defense, aerospace, medicine, production monitoring, etc. . Uncooled infrared focal plane detectors are able to work at room temperature, and have the advantages of light weight, small size, long life, low cost, low power, fast startup and good stability, etc., ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01J5/20B81B7/00B81B7/02B81C1/00
CPCB81B7/0009B81B7/02B81C1/00103B81C1/00476G01J5/20G01J2005/0077G01J2005/204
Inventor 邱栋王鹏陈文礼王宏臣
Owner YANTAI RAYTRON TECH
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