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A titanium diboride/tungsten coating with nano-layered structure and its preparation method

A titanium diboride and nano-layered technology is applied in the field of titanium diboride/tungsten coating and its preparation, which can solve the problems of no research report, and achieve the effects of simple process, short preparation period and convenient operation.

Active Publication Date: 2019-08-27
GUANGDONG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, W and TiB 2 With a similar crystal structure, it is possible to form a superlattice interface structure, but there is no research report in this area

Method used

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  • A titanium diboride/tungsten coating with nano-layered structure and its preparation method
  • A titanium diboride/tungsten coating with nano-layered structure and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] Embodiment 1 realizes the present invention according to the following steps:

[0034] (1) Cleaning the substrate: send the polished WC-Co cemented carbide substrate into an ultrasonic cleaning machine, and perform ultrasonic cleaning with acetone and absolute ethanol at 30kHz for 10min respectively, then clean it with deionized water, and then clean it with purity ≥99.5% nitrogen blow dry.

[0035] (2) Vacuumizing and ion beam etching to clean the cavity and substrate: the ion coating machine is equipped with a TiB2 planar target and a metal W columnar target, and the coating chamber is cleaned with a high-power vacuum cleaner. Place the substrate after ultrasonic cleaning on the workpiece support in the vacuum chamber, and pump it to a vacuum degree of 5.0×10- 3Below Pa, then turn on the ion source, pass 80sccm argon gas into the ion source, set the ion source power to 0.9kW, set the workpiece support bias to -300V, and the etching cleaning process lasts for 20min. ...

Embodiment 2

[0041] Embodiment 2 Realize the present invention according to the following steps:

[0042] (1) Cleaning the substrate: Send the polished (100)-oriented single crystal silicon substrate into an ultrasonic cleaning machine, perform ultrasonic cleaning with acetone and absolute ethanol at 30 kHz for 10 min, and then rinse with deionized water. Blow dry with nitrogen with purity ≥99.5%.

[0043] (2) Vacuumizing and ion beam etching to clean the cavity and substrate: the ion coating machine is equipped with a TiB2 planar target and a metal W columnar target, and the coating chamber is cleaned with a high-power vacuum cleaner. Place the substrate after ultrasonic cleaning on the workpiece support in the vacuum chamber, and evacuate the vacuum chamber to a vacuum of 5.0×10- 3 Below Pa, then turn on the ion source, feed 80sccm argon into the ion source, set the ion source power to 0.9kW, set the workpiece support bias to 300V, and the etching and cleaning process lasts for 20 minut...

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Abstract

The invention discloses a titanium diboride / tungsten coating with a nano layered structure and a preparation method of the coating. The preparation method of the TiB2 / W coating comprises the steps that a TiB2 ceramic target and a sprayed W target serve as raw materials, alternative sputtering deposition is conducted on a substrate through multi-target magnetron sputtering, and the titanium diboride / tungsten coating with the nano layered structure is formed by mutually superposing TiB2 ceramic layers and metal W layers, wherein the number of the metal W layers in the coating and the number of the TiB2 ceramic layers in the coating each ranges from 10 to 100, the thickness of each metal W layer ranges from 1 nm to 10 nm, and the thickness of each TiB2 layer ranges from 10 nm to 50 nm. According to the TiB2 / W coating with the nano layered structure, good toughness and high hardness are shown, so that the application range of the coating is greatly enlarged. Meanwhile, according to the magnetron sputtering double-target co-deposition technology used for preparing the TiB2 / W coating with the nano layered structure, operation is convenient, processes of post-treatment and the like are not needed, the preparation cycle is short, the cost is low, reproducibility is good, and industrial mass production can be achieved.

Description

technical field [0001] The invention belongs to the technical field of surface protection technology and related coating materials, in particular to a titanium diboride / tungsten coating with a nano-layered structure and a preparation method thereof. Background technique [0002] With the development of society and the advancement of industrial technology, the industrial field has put forward higher and higher requirements for the performance of materials. In many engineering applications, materials are required to have excellent comprehensive properties; not only high hardness and corrosion resistance are required , It is also required to have a low coefficient of friction, good high temperature stability, etc. In order to meet the increasingly complex and diverse engineering needs, a hard coating is applied on the surface of the material to improve the comprehensive performance of the material. A protective coating emerged as the times require. Hard coating can improve the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/06C23C14/18C23C14/16B82Y40/00
Inventor 代伟高翔王启民
Owner GUANGDONG UNIV OF TECH
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