Nanometer self-cleaning coating and preparation method thereof

A nanometer self-cleaning and coating technology, applied in the field of hydrophobic materials and photocatalytic materials, can solve the problems of no photocatalytic effect, inability to degrade organic pollutants, low transmittance, etc., achieving simple and easy preparation and breaking through climate. Limiting, mildly conditioned effects

Inactive Publication Date: 2017-12-15
NANJING UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] Chinese patent 201610727348.X discloses a method for preparing a super-hydrophobic coating, using hydrophobic nanoparticles with a mass fraction of 0.5% to 10% and hydrophobic resins with a mass fraction of 1% to 15% as raw materials, and the mixed solution formed after dissolution is naturally air-dried After drying, a superhydrophobic coating is obtained. The contact angle of the coating is 156°, and the rolling angle is 5°. It has superhydrophobic properties, but it does not have photocatalytic effect and cannot degrade organic pollutants. Rolling removal of water on the coated surface, limited by climate
Chinese patent 02115493.7 discloses a method of preparing a hydrophobic liquid with tridecafluorooctyl triethoxysilane and ethyl orthosilicate as the main substances. After the hydrophobic liquid is coated, it needs to go through a high temperature of 200 ° C to 350 ° C processing, inconvenient to use
In addition, most of the self-cleaning coatings currently on the market have low light transmittance, which is reflected in the macroscopically dim color, which affects the visual effect

Method used

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  • Nanometer self-cleaning coating and preparation method thereof
  • Nanometer self-cleaning coating and preparation method thereof
  • Nanometer self-cleaning coating and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Step 1: Dissolve 0.6 g of azobisisobutyronitrile (initiator) in 30 mL of o-xylene (organic solvent) to obtain an initiator solution. Take 2 / 3 of the initiator solution and place it in a 250mL four-necked flask equipped with an electric stirrer, a thermometer and a condenser.

[0030] Step 2: Heat 5mL trifluoroethyl methacrylate (fluorine-containing functional monomer) to 60°C under stirring, mix 15mL methyl methacrylate and 5mL butyl acrylate (soft and hard monomer) Drop the funnel into the four-neck flask. The dropping time is controlled at about 45min. After the dropwise addition of the monomer was completed, the remaining initiating solution (1 / 3) was added and reacted at a constant temperature of 60° C. for 1.5 hours.

[0031] Step 3: Dissolve 0.6g of water-based acrylic resin and 0.2g of azobisisobutyronitrile in 30mL of acetone, quickly add to fluorine-modified acrylic resin at 50-60°C, and react for 6-8 hours. Until the color gradually becomes transparent, a h...

Embodiment 3

[0040] This embodiment is basically the same as embodiment 1, the difference is that adding SiO 2 / TiO 2 The mass of the composite nano-hydrophobic particles is 1.0g, the contact angle of the obtained coating is 102°, and the transmittance corresponds to Figure 5 In the 5% curve, the transmittance can reach 70%.

Embodiment 4

[0042] This embodiment is basically the same as Embodiment 1, except that 2.80 g of nano-titanium dioxide (SiO 2 The mass ratio to the nanometer photocatalyst is 0.5), the nanocomposite particle synthesis step appears deposition, the product has a small amount of nanometer titanium dioxide, and the contact angle of the obtained coating is 130°.

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Abstract

The invention discloses a nanometer self-cleaning coating and a preparation method thereof. The preparation method comprises the following steps of: firstly synthesizing SiO2 by a hydrolyzation method, adding a nanometer photocatalyst in the synthetic process, preparing SiO2/photocatalyst hydrophobic composite nanoparticles with a photocatalytic property, then polymerizing fluorine-containing function monomers and soft-hard monomers under the action of an inhibitor to form fluorine-modified acrylic resin, and finally adding the SiO2/photocatalyst hydrophobic composite nanoparticles into the fluorine-modified acrylic resin, plating membranes by adopting a dipping-pulling method to prepare the nanometer self-cleaning coating. The nanometer self-cleaning coating and the preparation method disclosed by the invention have the advantages that the hydrophobic function and the photocatalytic function are achieved, organic dirt adhered on the surface of a basic material can be effectively decomposed into inorganic substances, and by combination of the hydrophobic function, the self-cleaning effect for the surface can be realized.

Description

technical field [0001] The invention belongs to the fields of hydrophobic materials and photocatalytic materials, and relates to a nanometer self-cleaning coating and a preparation method thereof. Background technique [0002] Hydrophobic functional surfaces have great application prospects in construction, environmental protection, military, shipping and other fields due to their excellent properties such as self-cleaning, anti-adhesion, anti-fouling and anti-corrosion, and drag reduction. [0003] Chinese patent 201610727348.X discloses a method for preparing a super-hydrophobic coating, using hydrophobic nanoparticles with a mass fraction of 0.5% to 10% and hydrophobic resins with a mass fraction of 1% to 15% as raw materials, and the mixed solution formed after dissolution is naturally air-dried After drying, a superhydrophobic coating is obtained. The contact angle of the coating is 156°, and the rolling angle is 5°. It has superhydrophobic properties, but it does not h...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09D133/00C09D133/16C09D133/12C09D7/12C08F220/22C08F220/14C08F220/18
CPCC08F220/14C08F220/22C08K2003/2241C08K2201/011C08L2205/02C09D133/00C08L33/16C08K3/36C08K3/22C08L33/14C08F220/1804
Inventor 王德齐余新宇冯琦李燕
Owner NANJING UNIV OF SCI & TECH
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