Preparation method of organic light-emitting display panel
An electroluminescence display and display panel technology, applied in circuits, electrical components, electrical solid devices, etc., can solve the problems of low luminous efficiency, low hole injection rate, and insufficient luminous brightness.
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[0039] see figure 1 , the preparation method of the organic electroluminescence display panel of one embodiment comprises the following steps:
[0040] S110, preparing an ITO film stacked on the base substrate on the surface of the base substrate.
[0041] In one embodiment, the matrix frame is prepared on the base substrate first, and then an ITO film is formed on the base substrate by magnetron sputtering as an anode.
[0042] In one embodiment, the thickness of the formed ITO film is 300nm-350nm.
[0043] S120, covering the surface of the ITO film with a protective film.
[0044]In one embodiment, the step of covering the surface of the ITO film with a protective film specifically includes: coating the protective slurry on the ITO film to form a protective film.
[0045] Wherein, the protective slurry is prepared through the following steps:
[0046] In parts by mass, dissolve 9.5 to 9.9 parts of sodium hydroxide in 44.2 to 47.9 parts of water, and add 21.4 to 22.5 part...
Embodiment 1
[0095] Form an ITO film with a thickness of 300nm on the base substrate as an anode, cover the surface of the ITO film away from the base substrate with a protective film, and then grind the surface of the base substrate away from the ITO until the thickness of the base substrate is less than 0.5mm Remove the bumps and scratches on the surface of the substrate, and then remove the protective film on the surface of the ITO film.
[0096] The surface of the ITO film away from the substrate is cleaned with detergent solution, ethanol, acetone and water in sequence by spraying. After the cleaning is completed, the surface of the ITO film away from the substrate is treated with a surface treatment solution. For activation treatment, the surface treatment liquid includes a mixed solution of water, hydrogen peroxide and ammonia water, and the mass percentage of hydrogen peroxide is 15%, and the mass percentage of ammonia water is 15%. Then plasma treatment is performed on the surface...
Embodiment 2
[0100] Form an ITO film with a thickness of 350nm on the base substrate as an anode, cover the surface of the ITO film away from the base substrate with a protective film, and then grind the surface of the base substrate away from the ITO until the thickness of the base substrate is less than 1.0mm Remove the bumps and scratches on the surface of the substrate, and then remove the protective film on the surface of the ITO film.
[0101] The surface of the ITO film away from the substrate is cleaned with detergent solution, ethanol, acetone and water in sequence by spraying. After the cleaning is completed, the surface of the ITO film away from the substrate is treated with a surface treatment solution. For activation treatment, the surface treatment liquid includes a mixed solution of water, hydrogen peroxide and ammonia water, and the mass percentage of hydrogen peroxide is 13%, and the mass percentage of ammonia water is 13%. Then plasma treatment is performed on the surface...
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