High-dispersity acidic copper plating additive and preparation method and application thereof
An acidic copper plating, highly dispersed technology, applied in the manufacture of printed circuits, the formation of electrical connections of printed components, electrical components, etc., can solve the problems of increasing energy consumption of electroplating production lines, reducing production capacity of electroplating lines, and increasing manufacturing costs. The effect of bright layer, high electrical conductivity, and simple composition
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[0061] A highly dispersed acid copper plating additive, its composition is as follows:
[0062] Divalent sulfide main brightener 1.5g / L
[0063] Polyethylene glycol 1000015g / L
[0064] Poly(ethylene glycol-propylene glycol) monomethyl ether 50g / L
[0065] Benzyltriethylammonium chloride 1g / L
[0066] Sulfuric acid 10ml / L
[0067] Formaldehyde 1ml / L
[0068] The balance is deionized water;
[0069] Wherein, the divalent sulfide main brightener is a mixture of sodium polydithiodipropane sulfonate and phenyl polydithiodipropane sodium sulfonate.
[0070] A kind of copper plating liquid that adds highly dispersed acidic copper plating additive, its component is as follows:
[0071] Copper sulfate pentahydrate 68g / L
[0072] Sulfuric acid 210g / L
[0074] Highly dispersed acidic copper plating additive 5ml / L
[0075] A method for applying highly dispersed acidic copper plating additives to the electroplating of via holes in printed circuit boards,...
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