Polishing disc for polishing machine with good oxidation resistance and wear resistance, and preparation process thereof

A wear-resistant performance and polishing machine technology, which is applied in the direction of grinding/polishing equipment, manufacturing tools, abrasives, etc., can solve the problems of easily scratching the glass surface, high abrasive grain hardness, and uneven distribution of pores on the polishing disc, reaching the price Effect of low cost, high surface quality, good oxidation resistance and wear resistance

Active Publication Date: 2018-08-17
宁国市顺鑫金属制品有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is precisely because diamond has unique physical and chemical properties that the tools it prepares play an irreplaceable role in the field of precision and ultra-precision machining; in addition, the internal pores of the polishing discs currently produced on the market are unevenly distributed, The hardness of the abrasive grains is high, many of which are much higher than that of glass products, and it is especially easy to scratch the glass surface during the polishing process

Method used

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  • Polishing disc for polishing machine with good oxidation resistance and wear resistance, and preparation process thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] A polishing disc for a polishing machine with good oxidation resistance and wear resistance is made of the following raw materials in parts by weight:

[0024] 80 parts of asphalt, 3 parts of paraffin wax, 3 parts of microcrystalline wax, 6 parts of rosin, 1 part of porous expanded perlite, 1.5 parts of silicon dioxide, 2 parts of abrasive, 3 parts of hydrated magnesium silicate, 4 parts of petroleum grease.

[0025] Wherein, the abrasive is a mixture of diamond, boron carbide, aluminum oxide, iron oxide and cerium oxide, and the particle size of the abrasive is 0.05um.

Embodiment 2

[0027] A polishing disc for a polishing machine with good oxidation resistance and wear resistance is made of the following raw materials in parts by weight:

[0028] 100 parts of asphalt, 9 parts of paraffin, 8 parts of microcrystalline wax, 18 parts of rosin, 3 parts of porous expanded perlite, 4.5 parts of silicon dioxide, 7 parts of abrasive, 1 part of hydrated magnesium silicate, 2 parts of petroleum grease.

[0029] Wherein, the abrasive is a mixture of silicon carbide, magnesium oxide and zirconia, and the particle size of the abrasive is 3 μm.

Embodiment 3

[0031] A polishing disc for a polishing machine with good oxidation resistance and wear resistance is made of the following raw materials in parts by weight:

[0032] 90 parts of asphalt, 6 parts of paraffin wax, 5 parts of microcrystalline wax, 12 parts of rosin, 2 parts of porous expanded perlite, 3 parts of silicon dioxide, 4 parts of abrasive, 2 parts of hydrated magnesium silicate, and 3 parts of petroleum grease.

[0033] Wherein, the abrasive is a mixture of diamond, silicon carbide, boron carbide, magnesium oxide, iron oxide and cerium oxide, and the particle size of the abrasive is 1um.

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Abstract

The invention provides a polishing disc for a polishing machine with good oxidation resistance and wear resistance, and a preparation process thereof, and relates to the technical field of polishing discs. The polishing disc is prepared by taking asphalt, paraffin wax, microcrystalline wax, rosin, porous expanded perlite, silicon dioxide, abrasive material, hydrated magnesium silicate and petrolatum as raw materials. The preparation process of the polishing disc comprises the processes of asphalt extraction, solid-phase raw material crushing, stirring and mixing, pouring and curing, cooling and die release, and the like. The material of the polishing disc provided by the invention is high in surface quality, free from pores and impurities, and low in price; and the polishing disc product further has good oxidation resistance and wear resistance in addition to the traditional heat dispersion performance of the polishing disc.

Description

technical field [0001] The invention relates to the technical field of polishing discs, in particular to a polishing disc for a polishing machine with good oxidation resistance and wear resistance and a preparation process thereof. Background technique [0002] Polishing refers to the use of mechanical, chemical or electrochemical action to reduce the surface roughness of the workpiece to obtain a bright and smooth surface. Traditional chemical mechanical polishing uses polishing pads to transmit and evenly distribute polishing liquid, and uses the chemical reaction between the composition of the polishing liquid and the surface of the material to be polished to produce substances that are relatively easy to remove, and the physical friction between the polishing particles and the surface to be polished, to achieve polishing. Purpose. [0003] Since diamond is the hardest substance in nature and has strong chemical inertness, it is recognized as one of the difficult-to-mach...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24D3/00B24D18/00
CPCB24D3/00B24D18/00
Inventor 杨继顺
Owner 宁国市顺鑫金属制品有限公司
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