Modified high-efficiency crystalline silicon solar cell and preparation method thereof
A technology of solar cells and crystalline silicon, which is applied in the field of solar cells to achieve the effects of promoting the absorption of sunlight, increasing the tap density, and improving the aspect ratio of electrodes
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Embodiment 1
[0030] Embodiment 1 Preparation of modified high-efficiency crystalline silicon solar cell I
[0031] Step 1, cleaning the crystalline silicon substrate to remove the surface damage layer;
[0032] Step 2. Put the cleaned crystalline silicon substrate into a solution containing silicon dioxide nanospheres with a particle size of 300-500 nm, so that the surface of the crystalline silicon substrate is coated with a silicon dioxide nano-dispersion layer, and then the surface coated with two The crystalline silicon substrate of the silicon oxide nano-dispersed layer is placed in an alkaline solution for etching, and the etching conditions are: the alkaline solution is a tetramethylammonium hydroxide solution with a mass concentration of 7.8%wt, the temperature is 70°C, and the etching time is for 3-6min, and then respectively use the first acid cleaning solution, the second acid cleaning solution and deionized water to clean the corroded crystal silicon substrate, and the cleaning...
Embodiment 2
[0040] Embodiment 2 Preparation of modified high-efficiency crystalline silicon solar cell II
[0041] Step 1, cleaning the crystalline silicon substrate to remove the surface damage layer;
[0042] Step 2. Put the cleaned crystalline silicon substrate into a solution containing silicon dioxide nanospheres with a particle size of 300-500 nm, so that the surface of the crystalline silicon substrate is coated with a silicon dioxide nano-dispersion layer, and then the surface coated with two The crystalline silicon substrate of the silicon oxide nano-dispersed layer is placed in an alkaline solution for etching, and the etching conditions are: the alkaline solution is a tetramethylammonium hydroxide solution with a mass concentration of 7.8%wt, the temperature is 70°C, and the etching time is for 3-6min, and then respectively use the first acid cleaning solution, the second acid cleaning solution and deionized water to clean the corroded crystal silicon substrate, and the cleanin...
Embodiment 3
[0050] Example 3 Preparation of Modified High Efficiency Crystalline Silicon Solar Cell III
[0051] Step 1, cleaning the crystalline silicon substrate to remove the surface damage layer;
[0052] Step 2. Put the cleaned crystalline silicon substrate into a solution containing silicon dioxide nanospheres with a particle size of 300-500 nm, so that the surface of the crystalline silicon substrate is coated with a silicon dioxide nano-dispersion layer, and then the surface coated with two The crystalline silicon substrate of the silicon oxide nano-dispersion layer is placed in an alkaline solution for etching, and the etching conditions are: the alkaline solution is a tetramethylammonium hydroxide solution with a mass concentration of 7.8%wt, the temperature is 70°C, and the etching time is for 3-6min, and then respectively use the first acid cleaning solution, the second acid cleaning solution and deionized water to clean the corroded crystal silicon substrate, the cleaning con...
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