Composite anode materials for lithium-ion batteries
A technology for lithium-ion batteries and negative electrode materials, applied in battery electrodes, secondary batteries, nanotechnology for materials and surface science, etc. Current charge and discharge capacity and other issues, to achieve the effect of suppressing volume effect, improving charge and discharge performance and service life
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[0017] The preparation method of the composite negative electrode material for the above-mentioned lithium ion battery is:
[0018] (1) Clean the silicon substrate, and deposit a layer of tin oxide and nickel metal on the silicon substrate with a tin target and a nickel target respectively;
[0019] (2) Using methane as an auxiliary gas, the mixture of diamond powder and aluminum powder is sprayed onto the surface of the silicon substrate in step (1) by means of supersonic flame spraying to obtain a negative electrode material for lithium-ion batteries.
[0020] In the present invention, described tin oxide is also a kind of high specific capacity (theoretical charge-discharge capacity is up to 790mAh / g), low intercalation lithium potential, good safety performance novel lithium battery anode material, but the first irreversible capacity of tin oxide is relatively low large, the electrochemical performance declines rapidly, and the cycle stability is very poor, which limits it...
Embodiment 1
[0033] A preparation method of lithium ion battery negative electrode material:
[0034] (1) Cleaning the silicon substrate. After the silicon substrate is cleaned, the silicon substrate is placed in a deposition chamber. In the presence of an inert gas, the bias power is turned on, and the silicon substrate is sputtered and cleaned with a plasma of an inert gas;
[0035] The process parameters of the sputtering cleaning are: power supply 30kW; deposition chamber pressure is 2Pa, negative bias voltage applied to the substrate is -600V, the duty cycle of the bias voltage is 50%, and the sputtering cleaning time is 10min;
[0036] Using Youwei IN-LINE continuous sputtering machine as the sputtering equipment, deposit a layer of tin oxide and nickel metal on the silicon substrate in sequence;
[0037] Specifically, in No. 1 deposition chamber, argon is used as the sputtering gas, the feed rate of argon gas is 120ml / min, the reactive gas that feeds in is oxygen, and the feed rate ...
Embodiment 2
[0044] The preparation method of this embodiment is the same as that of the lithium-ion battery negative electrode material in Example 1, the difference is that the stroke motor frequency of the continuous sputtering machine is controlled so that the deposition thickness of tin oxide is 1 μm, and the deposition thickness of nickel metal is 0.5 μm .
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