Multilayer multi-element nano composite self-lubricating hard coating and preparation method and application thereof
A nano-composite, hard coating technology, applied in coating, metal material coating process, superimposed layer plating, etc., can solve the problem of low metal ionization rate, poor coating surface quality, and poor film-base bonding force. and other problems, to achieve the effect of low friction coefficient, high hardness and improved high temperature wear resistance
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Embodiment 1
[0031] (1) Fix the pretreated substrate base on the workpiece turret in the coating chamber, adjust the rotation speed of the workpiece turret to 3rpm, make the substrate face the target surface, adjust the vertical target base distance to 4cm, and the horizontal target base At a distance of 120cm, turn on the heater to raise the temperature to 200°C, and pre-pump the background vacuum to 5.0×10 -3 Pa;
[0032] (2) Open the Ar gas flow valve, adjust the air pressure to 1.8Pa, turn on the DC pulse bias power supply, adjust the substrate bias voltage to -1000V, the duty cycle is 40%, the frequency is 80kHz, and the cavity is cleaned by glow sputtering for 30 minutes;
[0033] (3) Reduce the bias voltage of the substrate to -800V, adjust the Ar pressure to 0.5Pa, turn on the Cr arc target, adjust the target current to 100A, and bombard the substrate with high-energy Cr ions for 2 minutes to generate pseudo-metallurgical interface bonding and improve the bonding force of the film ...
Embodiment 2
[0041] (1) Fix the pretreated substrate base on the workpiece turret in the coating chamber, adjust the rotation speed of the workpiece turret to 3rpm, make the substrate face the target surface, adjust the vertical target base distance to 10cm, and the horizontal target base At a distance of 120cm, turn on the heater to raise the temperature to 200°C, and pre-pump the background vacuum to 5.0×10 -3 Pa;
[0042] (2) Open the Ar gas flow valve, adjust the air pressure to 1.8Pa, turn on the DC pulse bias power supply, adjust the substrate bias voltage to -1000V, the duty cycle is 40%, the frequency is 80kHz, and the cavity is cleaned by glow sputtering for 30 minutes;
[0043] (3) Reduce the bias voltage of the substrate to -800V, adjust the Ar pressure to 0.5Pa, turn on the Cr arc target, adjust the target current to 100A, and bombard the substrate with high-energy Cr ions for 2 minutes to generate pseudo-metallurgical interface bonding and improve the bonding force of the film...
Embodiment 3
[0051] (1) Fix the pretreated substrate base on the workpiece turret in the coating chamber, adjust the rotation speed of the workpiece turret to 3rpm, make the substrate face the target surface, adjust the vertical target base distance to 16cm, and the horizontal target base At a distance of 120cm, turn on the heater to raise the temperature to 200°C, and pre-pump the background vacuum to 5.0×10 -3 Pa;
[0052] (2) Open the Ar gas flow valve, adjust the air pressure to 1.8Pa, turn on the DC pulse bias power supply, adjust the substrate bias voltage to -1000V, the duty cycle is 40%, the frequency is 80kHz, and the cavity is cleaned by glow sputtering for 30 minutes;
[0053] (3) Reduce the bias voltage of the substrate to -800V, adjust the Ar pressure to 0.5Pa, turn on the Cr arc target, adjust the target current to 100A, and bombard the substrate with high-energy Cr ions for 2 minutes to generate pseudo-metallurgical interface bonding and improve the bonding force of the film...
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