Carbon-based adsorbent and preparation method thereof
An adsorbent, carbon-based technology, applied in chemical instruments and methods, adsorbed water/sewage treatment, other chemical processes, etc., can solve the problems of poor adsorption performance, single element type, etc., achieve easy recovery, wide pH range, The effect of excellent adsorption activity
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Embodiment 1
[0037] 100mg SiO 2 Evenly dispersed in 100mL of methanol, ultrasonic 10min. Dissolve 300mg of hexachlorotripolyphosphazene and 600mg of bisphenol S in 10mL of methanol solution, add dropwise to the ultrasonically dispersed silica suspension, and stir for 5 minutes; add 0.6mL of triethylamine dropwise to the above suspension, and stir 1 hour. The resulting product was washed three times with methanol and dried under vacuum at 60°C. The obtained product was carbonized at 400° C. under an argon atmosphere at a heating rate of 2° C. / min. Then, it was etched in 0.5 mol / L sodium hydroxide solution for 2 hours, and the product was washed with desalted water until neutral, and dried in vacuum at 60°C.
[0038] Such as figure 1 , figure 2 As shown, after removing the silica template by etching, it can be clearly seen that the adsorbent presents a three-dimensional inverse opal-type framework structure. image 3 It is the X-ray photoelectron spectroscopy (XPS) analysis of the ads...
Embodiment 2
[0042] 200mg SiO 2 Evenly dispersed in 100mL ethanol, ultrasonic 15min. Dissolve 300mg of hexachlorotripolyphosphazene and 1000mg of bisphenol S in 50mL of methanol solution, add dropwise to the ultrasonically dispersed silica suspension, and stir for 10min; add 0.9mL of triethylamine dropwise to the above suspension, and stir 3 hours. The resulting product was washed three times with methanol and dried under vacuum at 60°C. The obtained product was carbonized at 500° C. under an argon atmosphere at a heating rate of 3° C. / min. Then, it was etched in 5.0 mol / L sodium hydroxide solution for 6 hours, and the product was washed with desalted water until it was neutral, and dried in vacuum at 60°C.
Embodiment 3
[0044] 300mg SiO 2 Evenly dispersed in 100mL of methanol, ultrasonic 20min. Dissolve 300mg of hexachlorotripolyphosphazene and 1500mg of bisphenol S in 100mL of methanol solution, add dropwise the ultrasonically dispersed silica suspension, and stir for 15 minutes; add 1.2mL of triethylamine dropwise to the above suspension, and stir 5 hours. The resulting product was washed three times with methanol and dried under vacuum at 60°C. The obtained product was carbonized at 600° C. under a nitrogen atmosphere at a heating rate of 5° C. / min. Then, it was etched in 0.5 mol / L potassium hydroxide solution for 10 hours, and the product was washed with desalted water to neutrality, and dried in vacuum at 60°C.
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