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Polishing material for synthetic quarts glass substrate and method for polishing synthetic quarts glass substrate

一种玻璃基板、合成石英的技术，应用在含研磨剂的抛光组合物、研磨装置、研磨机床等方向，能够解决石英玻璃基板表面划痕等问题，达到抑制缺陷产生、反应性提高、研磨速度提高的效果

Active Publication Date: 2018-12-28
SHIN ETSU CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In general, dry ceria particles are used for ceria-based abrasives, and when dry ceria particles are applied to abrasives in an amorphous crystal form, there is a technology that tends to cause defects such as scratches on the surface of the quartz glass substrate question

Method used

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  • Polishing material for synthetic quarts glass substrate and method for polishing synthetic quarts glass substrate
  • Polishing material for synthetic quarts glass substrate and method for polishing synthetic quarts glass substrate
  • Polishing material for synthetic quarts glass substrate and method for polishing synthetic quarts glass substrate

Examples

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preparation example Construction

[0054] The method for producing the above-mentioned wet ceria matrix particles is not particularly limited, and the following methods can be used. First, a cerium salt as a precursor is mixed with ultrapure water to prepare an aqueous cerium solution. Cerium salt and ultrapure water can be mixed at a ratio of 2:1 to 4:1, for example. Here, as the cerium salt, at least one of Ce(III) salt and Ce(IV) salt can be used. That is, at least one Ce(III) salt can be mixed with ultrapure water, or at least one Ce(IV) salt can be mixed with ultrapure water, or at least one Ce(III) salt can be mixed with At least one Ce(IV) salt is mixed with ultrapure water. As the Ce(III) salt, cerium chloride, cerium fluoride, cerium sulfate, cerium nitrate, cerium carbonate, cerium perchlorate, cerium bromide, cerium sulfide, cerium iodide, cerium oxalate, cerium acetate, etc. can be mixed, as Ce(IV) salt can be mixed with cerium sulfate, cerium ammonium nitrate, cerium hydroxide, etc. Among them,...

Embodiment 1

[0074] (Synthesis of precursor particles composed of wet ceria)

[0075] 1000g of cerium (III) nitrate hexahydrate (Ce(NO 3 ) 3 ·6H 2 O) It was dissolved in 250 g of pure water, and 100 g of nitric acid was mixed with the resulting solution to obtain a cerium (III) solution. Next, 1 g of diammonium cerium nitrate ((NH 4 ) 2 Ce(NO 3 ) 3 ) was dissolved in 500 g of pure water to obtain a cerium (IV) solution. Next, the cerium (III) solution is mixed with the cerium (IV) solution to obtain a cerium mixed solution.

[0076] Under a nitrogen atmosphere, 4000 g of pure water was dripped into the reaction container, and then 1000 g of ammonia water was added dropwise to the reaction container, followed by stirring to obtain an alkaline solution.

[0077] Next, the cerium mixed solution was added dropwise to the reaction container, stirred, and heated to 80° C. under a nitrogen atmosphere. Heat treatment was performed for 8 hours to obtain a mixed solution containing wet ceri...

Embodiment 2

[0089] An abrasive was prepared in the same procedure as in Example 1 except that the content ratio (molar ratio) of cerium / lanthanum in the composite oxide particles was set to 50 / 50 (mol %)=1.0. The pH of the obtained abrasive was 6.3, and the average particle diameter of the abrasive particles measured by an electron microscope was 70 nm, the average particle diameter of the matrix particles was 60 nm, and the average particle diameter of the composite oxide particles was 10 nm.

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Abstract

The present invention is a polishing material for synthetic quarts glass substrates which comprises abrasive grains and water, characterized in that the abrasive grains comprise ceria particles as base particles and, fixed to the surfaces of the base particles, particles of a composite oxide including cerium and at least one rare-earth element selected from among trivalent rare-earth elements excluding cerium. Due to this, a polishing material for synthetic quarts glass substrates which has a high polishing rate and can be sufficiently inhibited from causing polishing defects is provided.

Description

technical field [0001] The invention relates to an abrasive for a synthetic quartz glass substrate and a grinding method for the synthetic quartz glass substrate. Background technique [0002] In recent years, due to miniaturization of patterns by photolithography, quality requirements such as defect density, defect size, surface roughness, and flatness of synthetic quartz glass substrates have become more stringent. Among them, with the increase in the fineness of integrated circuits and the increase in the capacity of magnetic media, further improvements in the quality of defects on substrates are required. [0003] From the above point of view, for the synthetic quartz glass substrate abrasive, in order to improve the quality of the polished quartz glass substrate, it is strongly required that the surface roughness of the polished quartz glass substrate is small and the scratches on the surface of the polished quartz glass substrate etc. have few surface defects. In add...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K3/14B24B37/00C03C19/00C09G1/02H01L21/304
CPCC09G1/02C09K3/1445B24B37/00C03C19/00C09G1/04C09K3/1436C09K3/1463B24B37/044C03C15/00
Inventor 高桥光人野岛义弘
Owner SHIN ETSU CHEM CO LTD
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