Infrared detector on basis of organic field-effect transistor and method for preparing infrared detector
An infrared detector and organic field technology, applied in the direction of organic semiconductor devices, semiconductor/solid-state device manufacturing, electric solid-state devices, etc., to achieve rich content, high-sensitivity and high-response detection, and enhance the effect of absorption
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[0040] Example 1:
[0041] Such as figure 1 The bottom-gate top-contact structure is shown. The materials and thickness of each layer are: the gate electrode, source electrode and drain electrode are all silver nanowires; the dielectric layer is made of silk fibroin with a thickness of 200nm; the organic semiconductor layer is carbon nano The tube is mixed with bamboo fiber (the mass fraction of bamboo fiber is 10%), and the thickness is 50nm; the thickness of the shellac encapsulation layer is 300nm. With this structure, a field effect transistor infrared detector with high sensitivity and high stability can be realized.
[0042] The preparation method of this embodiment is as follows:
[0043] ① Use detergent, acetone solution, deionized water and isopropanol solution to clean the substrate, and dry it with nitrogen after cleaning;
[0044] ②Prepare a 30nm thick silver nanowire gate electrode on the surface of the substrate;
[0045] ③70mg / ml silk fibroin solution was spin-coated on...
Example Embodiment
[0049] Example 2:
[0050] Such as figure 1 The bottom-gate top-contact structure is shown. The materials and thickness of each layer are: the gate electrode, source electrode and drain electrode are all gold nanowires; the dielectric layer uses silk fibroin with a thickness of 500nm; the organic semiconductor layer is 3- Hexylthiophene is mixed with bamboo fiber (bamboo fiber mass fraction is 5%), and the thickness is 30nm; the shellac packaging layer has a thickness of 200nm. With this structure, a field effect transistor infrared detector with high sensitivity and high stability can be realized.
[0051] The preparation method of this embodiment is as follows:
[0052] ① Use detergent, acetone solution, deionized water and isopropanol solution to clean the substrate, and dry it with nitrogen after cleaning;
[0053] ②Prepare a 30nm thick gold nanowire gate electrode on the surface of the substrate;
[0054] ③70mg / ml silk fibroin solution was spin-coated on the surface of the gate e...
Example Embodiment
[0058] Example 3:
[0059] Such as figure 1 The bottom-gate top-contact structure is shown. The materials and thickness of each layer are: gate electrode, source electrode and drain electrode are all iron nanowires; the dielectric layer is made of silk fibroin with a thickness of 600nm; the organic semiconductor layer is 6, 13-bis(triisopropylsilylethynyl)pentacene is mixed with bamboo fiber (bamboo fiber mass fraction is 8%), the thickness is 40nm, and the shellac packaging layer thickness is 200nm. With this structure, a field effect transistor infrared detector with high sensitivity and high stability can be realized.
[0060] The preparation method of this embodiment is as follows:
[0061] ① Use detergent, acetone solution, deionized water and isopropanol solution to clean the substrate, and dry it with nitrogen after cleaning;
[0062] ②Prepare 30nm thick iron nanowire gate electrode on the surface of the substrate;
[0063] ③70mg / ml silk fibroin solution was spin-coated on the ...
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