Low-cost and efficient crystalline silicon solar cell module
A solar cell, low-cost technology, applied in the field of solar cells, can solve the problems of increased silicon wafer breakage rate, component cracking, chemical reagent consumption, and current loss, etc., to improve open circuit voltage and fill factor, shorten transportation distance, The effect of reducing compound loss
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[0022] Example 1.
[0023] The emitter, passivation film, anti-reflection film, and electrode are sequentially prepared on the polished silicon wafer surface to form a cell, and then the cell is encapsulated with EVA and photovoltaic glass to form a component, where the passivation film is SiN x , The thickness is 48 nm; the anti-reflection film is a two-layer structure, and the first layer next to the surface of the passivation film has a refractive index of 1.92 and a thickness of 47 nm. Above the first layer is a second film with a refractive index of 1.62, the thickness is 59 nm; the refractive index of EVA is 1.48; the photovoltaic glass has an inverted pyramid structure on the side facing the cell, the bottom surface is a regular quadrilateral, and the cone apex angle is 54 o , The height is 0.2 µm, the refractive index is 1.5, and the thickness is 2 mm. The average reflectivity of the components in the 300-1100 nm wavelength range is 3%.
Example Embodiment
[0024] Example 2.
[0025] The emitter, passivation film, anti-reflection film, and electrode are sequentially prepared on the surface of the polished silicon wafer to form a cell, and then the cell is combined with EVA and photovoltaic glass to form a module, where the passivation layer is SiO 2 , The thickness is 30 nm; the anti-reflection film has a two-layer structure, the first layer next to the passivation layer has a refractive index of 2.3 and a thickness of 20 nanometers, and the second layer above the first layer has a refractive index of 2.0. The thickness is 74 nm; the refractive index of EVA is 1.5; the photovoltaic glass has an inverted pyramid structure on the side facing the cell, the bottom surface is a regular quadrilateral, and the cone apex angle is 54 o , The height is 0.2 µm, the refractive index of the glass is 1.51, and the average reflectivity of the manufactured component in the wavelength range of 300~1100 nm is 4.8%.
Example Embodiment
[0026] Example 3.
[0027] The emitter, passivation film, anti-reflection film, and electrode are sequentially prepared on the surface of the polished silicon wafer to form a cell, and then the cell is combined with EVA and photovoltaic glass to form a module, where the passivation film is Al 2 O 3 , The thickness is 50 nm; the anti-reflection film is a two-layer structure, the first layer next to the passivation layer has a refractive index of 2.37 and a thickness of 28 nm, and the second layer above the first layer has a refractive index of 2.1, The thickness is 54 nm; the refractive index of EVA is 1.51; the photovoltaic glass has an inverted pyramid structure on the side facing the cell, the bottom surface is a regular quadrilateral, and the cone apex angle is 54 o , The height is 0.2 µm, the refractive index is 1.52, and the average reflectivity of the manufactured components in the wavelength range of 300~1100 nm is 4%.
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