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Low-cost and efficient crystalline silicon solar cell module

A solar cell, low-cost technology, applied in the field of solar cells, can solve the problems of increased silicon wafer breakage rate, component cracking, chemical reagent consumption, and current loss, etc., to improve open circuit voltage and fill factor, shorten transportation distance, The effect of reducing compound loss

Inactive Publication Date: 2019-03-12
NANCHANG UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] (1) For cells, the texture + passivation anti-reflection film structure has the following disadvantages: (a) The texture structure makes the specific surface area of ​​the cell very large, making the transport distance and The recombination probability is greatly increased, resulting in an increase in current loss, and a decrease in open circuit voltage and fill factor; (b) when preparing a passivation anti-reflection film on the surface of a silicon wafer, the two aspects of surface passivation and anti-reflection are considered comprehensively, and the surface When the passivation effect and anti-reflection are optimal respectively, the thickness and refractive index of the passivation anti-reflection film are not consistent, which makes the passivation effect and anti-reflection not both optimal, thus limiting the open circuit voltage, short circuit current and filling (c) In the existing production technology, chemical reagents are usually used to etch silicon wafers for surface texture treatment, and the prepared suede is greatly affected by the composition of chemical reagents and process conditions, making the suede uniform The stability and stability are not easy to control, which makes it difficult to accurately control the thickness and unstable uniformity of the anti-reflection film on the suede surface, resulting in microscopic leakage loss of the battery and instability of battery performance; ( d) In the process of texturing the surface of crystalline silicon, stress will be introduced into the silicon wafer, which will easily cause microscopic cracks, resulting in an increase in the breakage rate of the silicon wafer and the hidden cracks in the later components; at the same time, when wet chemical etching is used , to consume a lot of chemical reagents, when using physical etching, you need expensive physical etching equipment, which will lead to increased production costs; (e) the textured silicon wafer surface will absorb all wavelengths of light, including insufficient In order to generate infrared radiation of electron-hole pairs, this will often increase the temperature of the battery, resulting in a decrease in output voltage, a decrease in actual efficiency, and a decrease in power generation; (f) when preparing metal electrodes on this uneven surface, in order to maintain and For the same resistive loss on a flat surface, more metal must be used, resulting in increased metal consumption
[0004] (2) For components, the design of the anti-reflection coating on the surface of the cell is optimized based on the performance test of the cell exposed to the air, and when the cell is packaged into a component by EVA and photovoltaic glass, the received spectrum and light intensity have changed, so that the layer of anti-reflection coating does not achieve the best anti-reflection effect on the module, which leads to the final contribution of the anti-reflection coating to the power generation of the module is not obvious

Method used

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  • Low-cost and efficient crystalline silicon solar cell module
  • Low-cost and efficient crystalline silicon solar cell module
  • Low-cost and efficient crystalline silicon solar cell module

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] The emitter, passivation film, anti-reflection film, and electrode are sequentially prepared on the surface of the polished silicon wafer to form a cell, and then the cell is packaged with EVA and photovoltaic glass to form a component, where the passivation film is SiN x , with a thickness of 48 nm; the anti-reflection film has a two-layer structure, the first layer is close to the surface of the passivation film, its refractive index is 1.92, and its thickness is 47 nm. 1.62, the thickness is 59 nm; the refractive index of EVA is 1.48; the side of the photovoltaic glass facing the cell is an inverted pyramid structure, the bottom surface is a regular quadrilateral, and the apex angle of the cone is 54 o , with a height of 0.2 µm, a refractive index of 1.5, and a thickness of 2 mm. The average reflectance of the fabricated components is 3% in the wavelength range of 300-1100 nm.

Embodiment 2

[0025] Prepare the emitter, passivation film, anti-reflection film, and electrode on the surface of the polished silicon wafer in sequence to form a battery sheet, and then combine the battery sheet with EVA and photovoltaic glass to form a module, in which the passivation layer is SiO 2 , with a thickness of 30 nm; the anti-reflection film has a two-layer structure, the first layer next to the passivation layer has a refractive index of 2.3, and the thickness is 20 nm, and the second layer above the first layer has a refractive index of 2.0. The thickness is 74 nm; the refractive index of EVA is 1.5; the side of the photovoltaic glass facing the cell is an inverted pyramid structure, the bottom surface is a regular quadrilateral, and the apex angle of the cone is 54 o , the height is 0.2 µm, the refractive index of the glass is 1.51, and the average reflectance of the fabricated components is 4.8% in the wavelength range of 300-1100 nm.

Embodiment 3

[0027] Prepare the emitter, passivation film, anti-reflection film, and electrode on the surface of the polished silicon wafer in sequence to form a battery sheet, and then combine the battery sheet with EVA and photovoltaic glass to form a module, in which the passivation film is Al 2 o 3 , the thickness is 50 nm; the anti-reflection film has a two-layer structure, the first layer is next to the passivation layer, its refractive index is 2.37, and its thickness is 28 nm, and the second layer is above the first layer, its refractive index is 2.1, The thickness is 54 nm; the refractive index of EVA is 1.51; the side of the photovoltaic glass facing the cell is an inverted pyramid structure, the bottom surface is a regular quadrilateral, and the apex angle of the cone is 54 o , with a height of 0.2 µm, a refractive index of 1.52, and an average reflectance of 4% in the wavelength range of 300-1100 nm.

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Abstract

The invention discloses a low-cost and efficient crystalline silicon solar cell module. The knotting is performed on a polished polycrystalline silicon wafer surface or monocrystalline silicon surfacewithout performing surface texturing processing, and then a passivation film and an anti-reflection film are orderly deposited, an electrode is prepared to form a cell, and then the cell and the EVAand the photovoltaic glass are packaged as the module. The carrier conveying distance is greatly shortened, and the passivation film and the anti-reflection film are separately optimized, so that thepassivation effect of the cell can reach the optimum, the composite loss is reduced, an open-circuit voltage and the filling factor of the cell are improved. Compared with the solar cell in the texturing technology, the influence of a system serial resistor caused by the solder strip in the module and the transmission loss in the conductor for system connection can be reduced; the dosage of the chemical reagent is greatly reduced, the fragment rate in the production and the sub-fissure in the module production can be reduced, the process is simple, the cost is low, and the efficiency is high;the absorption on the infrared radiation by the surface I s reduced, the cell temperature is reduced, and the module efficiency is improved.

Description

technical field [0001] The invention belongs to the technical field of solar cells, and relates to crystalline silicon solar cell components. Background technique [0002] In the existing crystalline silicon solar cell and component technology, textured surface and passivation anti-reflection film are usually used to reduce the optical loss and electrical loss of the solar cell, so as to optimize the performance indicators of the cell, and then through ethylene- Vinyl acetate copolymer (EVA) and photovoltaic glass are encapsulated to form solar cell modules. The absorption and reflection of sunlight by EVA and photovoltaic glass will reduce the luminous flux of sunlight reaching the cell, and reduce the current density and output power of the module. The light transmittance of the photovoltaic glass and the photovoltaic glass are independently optimized to reduce the package power loss of the module. However, there are following deficiencies in this technical process: [0...

Claims

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Application Information

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IPC IPC(8): H01L31/0216H01L31/048H01L31/068H01L31/18
CPCH01L31/02167H01L31/02168H01L31/0481H01L31/0488H01L31/068H01L31/1868Y02E10/546Y02E10/547Y02P70/50
Inventor 孙喜莲周浪黄海宾
Owner NANCHANG UNIV
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