A method for uniformly preparing gold nanodisk arrays in a large area on the end face of a flat optical fiber

Abstract

The invention discloses a method of uniformly preparing a gold nanodisk array on the end face of a flat-end optical fiber in a large area, and belongs to the technical field of micro-nano machining. According to the technical scheme, a phase step refractive index multimode optical fiber with the fiber core diameter of 110 microns is used; a two-step anodic treatment method is adopted to prepare anultra-thin highly ordered AAO template; and by accurate controlling the time of secondary anodizing treatment and corrosion of a phosphoric acid solution, the period of the template is finally determined to be 700 nm, the thickness of the template is 100 nm, and the hole diameter of the template is 200 nm, and the corresponding formed nanodisk array has the same period, the thickness and the diameter. The method has the advantages of being low in cost, simple to manufacture, controllable in the period, good in repeatability and the like so that the gold nanodisk array which are orderly arranged can be simply prepared on the end face of the optical fiber in the large area.

Description

technical field [0001] The invention belongs to the technical field of micro-nano processing, and in particular relates to a method for uniformly preparing a large-area gold nano-disk array on the end face of a flat optical fiber. Background technique [0002] In recent years, optical fibers have attracted much attention in the field of biochemical sensing due to a series of advantages such as small size, low power consumption, high reliability, and easy integration. Therefore, many plasmon resonance sensors based on optical fiber substrates have emerged, most of which use traditional nanoimprint technology to prepare metal nanostructures on the end faces of optical fibers. Compared with optical exposure machines and electron beam exposure machines, although the traditional nanoimprint technology has many advantages, due to the template damage caused by the direct contact between the template and the substrate during the photolithography process, the substrate and the imprin...

AI Technical Summary

Problems solved by technology

Compared with optical exposure machines and electron beam exposure machines, although the traditional nanoimprint technology has many advantages, due to the template damage caused by the direct contact between the template and the substrate during the photolithography process, the substrate and the imprinting glue fall off, making The entire imprint process is unstable

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