Visible light high absorbability far infrared high reflection film and preparation method thereof

A high-reflection film and high-absorption technology, applied in optics, optical components, sputtering coating, etc., can solve the problems of too bright surface, complex preparation process of low infrared emissivity coating, etc., and achieve reduced brightness and low reflectivity , the effect of high absorption rate

Pending Publication Date: 2019-05-28
UNIV OF ELECTRONIC SCI & TECH OF CHINA
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Problems solved by technology

[0006] In view of the above-mentioned problems or deficiencies, in order to solve the defects of the existing low-infrared emissivity coatings, which are complicated in preparation process and the surface is too bright, without affecting the characteristics of high reflection in the far-infrared band, the present inventio

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  • Visible light high absorbability far infrared high reflection film and preparation method thereof
  • Visible light high absorbability far infrared high reflection film and preparation method thereof
  • Visible light high absorbability far infrared high reflection film and preparation method thereof

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Embodiment Construction

[0027] The technical scheme of the present invention will be described in detail below in conjunction with the accompanying drawings and embodiments.

[0028] The schematic diagram of the simulation structure of the periodic unit of the present invention is as figure 2 shown; base layer is SiO 2 / Si substrate and aluminum film, where SiO 2 The thickness is 300nm, the thickness of the aluminum film is 50nm, the thickness of the dielectric layer is 5-9nm, the metal nano-island is a hemisphere with a radius of 5-25nm, the aluminum film and SiO 2 SiO on / Si substrate 2 contact on one side.

[0029] Its preparation method is:

[0030] Step 1. Electron beam evaporation on SiO 2 A layer of 50nm Al film was evaporated on the / Si substrate as the base layer.

[0031] Step 2, radio frequency sputtering a layer of SiO on the Al film with a magnetron sputtering device 2 film, the sputtering time is 5min, 7min, 9min respectively, the sputtering power is 80W, the corresponding SiO ...

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Abstract

The invention belongs to the field of novel nanometer materials, and particularly relates to a visible light high absorbability far infrared high reflection film. A dielectric layer and a metal nanoparticle layer are added on the basis of aluminium metal; through the contact between a metal nanometer island and the dielectric layer, the mode coupling is realized, and a plasmon oscillation cavity is generated; and by the adjustment of the thickness of the dielectric layer and the sizes of metal nanoparticles, the low reflectivity and high absorptivity characteristic of the film within the rangeof a visible light wavelength is realized, and the infrared stealth characteristic is not influenced when the lightness of the surface of the film is reduced. The absorptivity of the film within therange of visible light can reach 18.66%-59.04%, and the absorptivity of the film within the far infrared range does not exceed 1.40%-1.42%. A preparation method provided by the invention is relativelysimple, and the prepared visible light high absorbability far infrared high reflection film is excellent in parameter performance.

Description

technical field [0001] The invention belongs to the field of new nanometer materials, and specifically relates to a visible light high-absorption far-infrared high-reflection film, which has low reflectivity and high absorptivity in the visible light band and high reflectivity and low absorptivity in the far-infrared band. Background technique [0002] Coatings with high reflectivity and low absorption in the infrared band are widely used in construction, stealth, aerospace, military and other fields. This coating is mainly composed of low-emissivity coatings, generally using metal powders with high reflectivity and low absorptivity such as aluminum, titanium, copper, and silver. Aluminum metal has excellent characteristics such as corrosion resistance, good reflection performance, light weight, and low cost, and is the most commonly used low-emissivity pigment. However, it also has high reflectivity and low absorptivity in the visible light band, which makes the surface of...

Claims

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Application Information

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IPC IPC(8): C23C14/30C23C14/18C23C14/35C23C14/10C23C26/00C23C28/00G02B5/00
Inventor 彭波郭月莹
Owner UNIV OF ELECTRONIC SCI & TECH OF CHINA
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