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Application of Indium Tin Oxide with (400) Crystal Plane Preference in Transparent Thin Film Thermocouples

A technology of indium tin oxide and transparent film, which is applied in metal material coating process, vacuum evaporation plating, coating, etc., can solve the problem of high cost, time-consuming and anti-oxidation failure of indium tin oxide transparent film thermocouples, etc. problem, to achieve the effect of facilitating large-scale industrial production, high Seebeck coefficient, and simple preparation

Active Publication Date: 2020-12-04
DALIAN JIAOTONG UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the ordinary indium tin oxide film has a non-preferential polycrystalline center cubic ferromanganite phase structure. When measuring temperature in air, due to the non-preferential polycrystalline center cubic ferromanganite phase indium tin oxide film will react with oxygen in the air reaction, resulting in an irreversible change in the electrical properties of the indium tin oxide film, which in turn leads to a lower Seebeck coefficient for the thin-film thermocouple, which eventually leads to a decrease in the temperature measurement accuracy of the thin-film thermocouple
[0003] At present, in order to overcome the problem of unstable Seebeck coefficient in the temperature measurement process of indium tin oxide transparent film thermocouples, it is necessary to prepare a dense anti-oxidation coating on the surface of indium tin oxide film transparent film thermocouples, such as: SiO 2 、Al 2 o 3 、SiN x , AlN x etc., but these methods all have some deficiencies, such as: the larger stress in the anti-oxidation coating will destroy the indium tin oxide film material; the larger stress in the anti-oxidation coating will lead to anti-oxidation The coating is broken and peeled off, which leads to the failure of anti-oxidation; in the process of preparing the anti-oxidation coating, it is necessary to discharge to the outside the environment containing Cl, F, CO x , NH x , NO x Exhaust gases such as harmful gases, causing environmental pollution; the prepared indium tin oxide transparent film thermocouple has problems such as high cost, long time consumption, and low efficiency

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  • Application of Indium Tin Oxide with (400) Crystal Plane Preference in Transparent Thin Film Thermocouples
  • Application of Indium Tin Oxide with (400) Crystal Plane Preference in Transparent Thin Film Thermocouples
  • Application of Indium Tin Oxide with (400) Crystal Plane Preference in Transparent Thin Film Thermocouples

Examples

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Embodiment 1

[0021] An indium tin oxide having a (400) crystal plane in the transparent film thermocouple, using DC pulse magnetroid sputtering in natural room temperature, as a substrate material, will figure 1 The mask plate shown is placed on the substrate material, and the zinc aluminum oxide is a sputtering target, the purity of zinc aluminum oxide is 99.99%, wherein: zinc oxide has a mass percentage of 98 wt.%, Tri-aluminum The mass percentage was 2 wt.%, With argon as a sputter gas, and the purity of argon was 99.99%, and the electromagnetic sputtering was prepared by a transparent thin film thermocouple medium, and the thickness of the zinc aluminum oxide film electrode was 1500 nm; Then, a method of depositing a zinc aluminum oxide is based on the natural room temperature by a method of depositing a zinc aluminum oxide as a base material at a natural room temperature. figure 2 The mask plate shown is placed on the substrate material, and the indium tin oxide is a sputtering target, an...

Embodiment 2

[0026] An indium tin oxide having a (400) crystal plane in the transparent film thermocouple, using DC pulse magnetroid sputtering in natural room temperature, as a substrate material, will figure 1 The mask plate shown is placed on the substrate material, and the zinc aluminum oxide is a sputtering target, the purity of zinc aluminum oxide is 99.99%, wherein: zinc oxide has a mass percentage of 98 wt.%, Tri-aluminum The mass percentage was 2 wt.%, With argon as a sputter gas, and the purity of argon was 99.99%, and the electromagnetic sputtering was prepared by a transparent thin film thermocouple medium, and the thickness of the zinc aluminum oxide film electrode was 1500 nm; Then, a method of depositing a zinc aluminum oxide is based on a quartz plate of a zinc aluminum oxide using a radio frequency magnetron sputtering method. figure 2 The mask plate shown is placed on the substrate material, and the indium tin oxide is a sputtering target, and the purity of indium tin oxide i...

Embodiment 3

[0031] An indium tin oxide having a (400) crystal plane in the transparent film thermocouple, using DC pulse magnetroid sputtering in natural room temperature, as a substrate material, will figure 1The mask plate shown is placed on the substrate material, and the zinc aluminum oxide is a sputtering target, the purity of zinc aluminum oxide is 99.99%, wherein: zinc oxide has a mass percentage of 98 wt.%, Tri-aluminum The mass percentage was 2 wt.%, With argon as a sputter gas, and the purity of argon was 99.99%, and the electromagnetic sputtering was prepared, and the zinc aluminum oxide thin film electrode in which the zinc aluminum oxide thin film electrode was 600 nm; Then, a method of depositing a zinc aluminum oxide is based on the natural room temperature by a method of depositing a zinc aluminum oxide as a base material at a natural room temperature. figure 2 The mask plate shown is placed on the substrate material, and the indium tin oxide is a sputtering target, and the pu...

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Abstract

The invention relates to an application of indium tin oxide with (400) crystal plane preference on a transparent thin film thermocouple, and belongs to the technical field of thin film thermocouples.The body-centered cubic ferromanganese phase polycrystalline indium tin oxide with (400) crystal plane preference is made into one pole of the transparent thin film thermocouple by a direct current pulse magnetron sputtering method, and the duty ratio of the direct current pulse magnetron sputtering is 10-40%. According to the application of indium tin oxide with (400) crystal plane preference onthe transparent thin film thermocouple, the preferred orientation of the indium tin oxide film obtained by direct current pulse magnetron sputtering is controlled, so that the indium tin oxide transparent film thermocouple has the higher Zeebek coefficient.

Description

Technical field [0001] The present invention relates to an application having an indium tin oxide having a (400) crystal plane in the transparent film thermocouple, belonging to the technical field of film thermocouples. Background technique [0002] The film thermocouple has the advantages of low preparation cost, high sensitivity, short response time. At present, the film thermocouple is mainly composed of metal materials, such as: PT, Ni 90 CR 10 Ni 95 Si 5 Wait, the above metal film thermocouple is opaque in the visible range, and in certain special fields, the film thermocouple is required to be transparent in the visible range, such as: the lens surface of the space telescope, the glass surface of the spacecraft, Solar panels of solar panels, etc. Indium tin oxide film material is an important transparent conductive material that is important in the field of photoelectric conversion, such as: solar cell transparent electrode, flat panel display transparent electrode, photoe...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/08C23C14/35
Inventor 丁万昱刘浩陈卫超
Owner DALIAN JIAOTONG UNIVERSITY