Application of Indium Tin Oxide with (400) Crystal Plane Preference in Transparent Thin Film Thermocouples
A technology of indium tin oxide and transparent film, which is applied in metal material coating process, vacuum evaporation plating, coating, etc., can solve the problem of high cost, time-consuming and anti-oxidation failure of indium tin oxide transparent film thermocouples, etc. problem, to achieve the effect of facilitating large-scale industrial production, high Seebeck coefficient, and simple preparation
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Embodiment 1
[0021] An indium tin oxide having a (400) crystal plane in the transparent film thermocouple, using DC pulse magnetroid sputtering in natural room temperature, as a substrate material, will figure 1 The mask plate shown is placed on the substrate material, and the zinc aluminum oxide is a sputtering target, the purity of zinc aluminum oxide is 99.99%, wherein: zinc oxide has a mass percentage of 98 wt.%, Tri-aluminum The mass percentage was 2 wt.%, With argon as a sputter gas, and the purity of argon was 99.99%, and the electromagnetic sputtering was prepared by a transparent thin film thermocouple medium, and the thickness of the zinc aluminum oxide film electrode was 1500 nm; Then, a method of depositing a zinc aluminum oxide is based on the natural room temperature by a method of depositing a zinc aluminum oxide as a base material at a natural room temperature. figure 2 The mask plate shown is placed on the substrate material, and the indium tin oxide is a sputtering target, an...
Embodiment 2
[0026] An indium tin oxide having a (400) crystal plane in the transparent film thermocouple, using DC pulse magnetroid sputtering in natural room temperature, as a substrate material, will figure 1 The mask plate shown is placed on the substrate material, and the zinc aluminum oxide is a sputtering target, the purity of zinc aluminum oxide is 99.99%, wherein: zinc oxide has a mass percentage of 98 wt.%, Tri-aluminum The mass percentage was 2 wt.%, With argon as a sputter gas, and the purity of argon was 99.99%, and the electromagnetic sputtering was prepared by a transparent thin film thermocouple medium, and the thickness of the zinc aluminum oxide film electrode was 1500 nm; Then, a method of depositing a zinc aluminum oxide is based on a quartz plate of a zinc aluminum oxide using a radio frequency magnetron sputtering method. figure 2 The mask plate shown is placed on the substrate material, and the indium tin oxide is a sputtering target, and the purity of indium tin oxide i...
Embodiment 3
[0031] An indium tin oxide having a (400) crystal plane in the transparent film thermocouple, using DC pulse magnetroid sputtering in natural room temperature, as a substrate material, will figure 1The mask plate shown is placed on the substrate material, and the zinc aluminum oxide is a sputtering target, the purity of zinc aluminum oxide is 99.99%, wherein: zinc oxide has a mass percentage of 98 wt.%, Tri-aluminum The mass percentage was 2 wt.%, With argon as a sputter gas, and the purity of argon was 99.99%, and the electromagnetic sputtering was prepared, and the zinc aluminum oxide thin film electrode in which the zinc aluminum oxide thin film electrode was 600 nm; Then, a method of depositing a zinc aluminum oxide is based on the natural room temperature by a method of depositing a zinc aluminum oxide as a base material at a natural room temperature. figure 2 The mask plate shown is placed on the substrate material, and the indium tin oxide is a sputtering target, and the pu...
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