Chemical pretreatment and dielectrophoresis synergistic silicon carbide plane polishing method and device
A technology of synergy and polishing device, applied in chemical instruments and methods, machine tools for surface polishing, after treatment, etc., can solve the problem of uneven distribution of shear force on the surface of workpieces, difficulty in machining accuracy, and energy attached to abrasive particles. Reduce and other problems to achieve the effect of prolonging residence time, good surface quality and high processing efficiency
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[0031] The present invention will be described in detail below according to the accompanying drawings and preferred embodiments, and the purpose and effect of the present invention will become clearer. The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0032] A silicon carbide planar polishing method with chemical pretreatment and dielectrophoresis synergy, the method comprising the steps of:
[0033] S1: Put the silicon carbide workpiece in the pretreatment workpiece groove, seal it with negative compression material, and only expose the plane to be polished;
[0034] S2: Put the silicon carbide sheet treated in S1 into Fenton's reagent for pretreatment, so that a silicon dioxide corrosion layer is formed on the surface of the silicon carbide. The F...
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