Perovskite solar cell and preparation method thereof
A perovskite structure, solar cell technology, applied in the field of solar cells, can solve the problems of high open circuit voltage, long diffusion length, difficult to reach, etc., and achieve the effects of strong light absorption, low energy consumption, and simple preparation conditions
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Embodiment 1
[0048] A preparation method of a one-step perovskite structure solar cell:
[0049] (1) Etching the FTO substrate: Cut the FTO glass to 25mm×30mm, then use adhesive tape to protect the middle 10mm×30mm area as an electrode, and etch the other areas with hydrochloric acid dipped in zinc powder until the etched area become transparent;
[0050] (2) Cleaning the FTO substrate: Remove the protective tape from the etched FTO substrate, and use a surfactant to perform preliminary scrubbing to remove surface impurities, and then put the FTO substrate in turn, with 10% volume concentration of Decon-90 Cleaning agent, deionized water, acetone, alcohol, and deionized water are ultrasonically cleaned for 15 minutes in sequence;
[0051] (3) spin-coated TiO 2 Barrier layer: Dry the cleaned FTO substrate with a nitrogen gun, send it into the pretreatment chamber, adjust the chamber pressure to 60Pa with a flow rate of 30sccm below 3Pa, and then start the power supply to generate O 2 Pla...
Embodiment 2
[0085] A preparation method of a two-step perovskite structure solar cell:
[0086] (1) Etching the FTO substrate: The FTO glass used in this experiment was cut to a size of 25mm*30mm, and then the middle 10mm*30mm area was protected with adhesive tape as an electrode, and the other areas were dipped in hydrochloric acid with zinc powder Etching is performed until the etched area becomes transparent;
[0087] (2) Cleaning the FTO substrate: Remove the protective tape from the etched FTO substrate, and use a surfactant to perform preliminary scrubbing to remove surface impurities, and then put the FTO substrate in turn, with 10% volume fraction of Decon-90 Cleaning agent, deionized water, acetone, alcohol, and deionized water are ultrasonically cleaned for 15 minutes in sequence;
[0088] (3) spin-coated TiO 2 Barrier layer: Dry the cleaned FTO substrate with a nitrogen gun, send it into the pretreatment chamber, adjust the chamber pressure to 60Pa with a flow rate of 30sccm ...
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