Preparation method of wire mesh denitration catalyst for SCR and catalyst prepared by preparation method
A denitration catalyst and wire mesh technology, applied in the field of environmental protection catalytic materials, can solve the problems of difficult loading of active components on the surface, low specific surface area, etc., and achieve the effects of good ultra-low temperature denitration activity, wide temperature window and overcoming easy peeling.
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Embodiment 1
[0042] The preparation method of wire mesh SCR denitration catalyst comprises the following steps:
[0043] (1) Cleaning of the carrier: take a stainless steel wire mesh with an alumina coating thickness of 50 μm, place it in a mixed solution of absolute ethanol and acetone, clean it ultrasonically, dry it, and set aside;
[0044] (2) Chemical etching: place the carrier cleaned in step (1) in an aqueous NaOH solution with a concentration of 0.5mol / L and let it stand for etching for 15 minutes. The etching temperature is 20°C. After taking it out, clean it and dry it. ; Then put the carrier in the HF solution with a concentration of 3mol / L and let it etch for 20min. The etching temperature is 20°C. Pit micro-nano structure;
[0045] (3) Weigh 156.3g cerium nitrate hexahydrate, 181.3g manganese nitrate tetrahydrate and 80g molybdenum nitrate pentahydrate and dissolve them in 1000mL deionized water, stir and dissolve, then add 200g silica sol (35wt% solid content, dispersant for...
Embodiment 2
[0052] The preparation method of wire mesh SCR denitration catalyst comprises the following steps:
[0053] (1) Cleaning of the carrier: take a stainless steel wire mesh with an alumina coating thickness of 80 μm, place it in a mixed solution of absolute ethanol and acetone, clean it ultrasonically, dry it, and set aside;
[0054] (2) Chemical etching: place the carrier cleaned in step (1) in an aqueous NaOH solution with a concentration of 2 mol / L and let it stand for etching for 5 minutes at an etching temperature of 30° C. After taking it out, clean it and dry it; Then put the carrier in an HF solution with a concentration of 8mol / L and let it stand for etching for 5 minutes. The etching temperature is 30°C. Pit micro-nano structure;
[0055] (3) Weigh 212.5g cerium nitrate hexahydrate, 246.3g manganese nitrate tetrahydrate and 90g molybdenum nitrate pentahydrate and dissolve them in 1000mL deionized water, stir and dissolve, then add 200g silica sol (35wt% solid content, ...
Embodiment 3
[0062] The preparation method of wire mesh SCR denitration catalyst comprises the following steps:
[0063] (1) Cleaning of the carrier: take a stainless steel wire mesh with an alumina coating thickness of 80 μm, place it in a mixed solution of absolute ethanol and acetone, clean it ultrasonically, dry it, and set aside;
[0064] (2) Chemical etching: place the carrier cleaned in step (1) in an aqueous NaOH solution with a concentration of 2 mol / L and let it stand for etching for 15 minutes at an etching temperature of 50° C. After taking it out, clean it and dry it; Then put the carrier in the HF solution with a concentration of 5mol / L and let it etch for 10min. The etching temperature is 50°C. Pit micro-nano structure;
[0065] (3) Weigh 268.8g cerium nitrate hexahydrate, 246.3g manganese nitrate tetrahydrate and 80g molybdenum nitrate pentahydrate and dissolve them in 1500mL deionized water, stir and dissolve, then add 260g silica sol (35wt% solid content, dispersant of s...
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