Catalytic combustion gas sensor based on ceramic-based micro-hotplate and preparation method of sensor

A gas sensor, catalytic combustion technology, applied in instruments, scientific instruments, measuring devices, etc., can solve the problems of expensive equipment, high production cost, and reduced power consumption of catalytic combustion gas sensors.

Pending Publication Date: 2020-01-07
SAIC MOTOR +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Secondly, the silica material used still has a high thermal conductivity (7W/m K), which is not conducive to the further reduction of the power consumption of the catalytic combustion gas sensor
Furthermore, both the dielectric film and the resistance heating film are prepared by chemical or physical vapor deposition process, the required equipment is relatively expensive, and the cost of the preparation process is also high, which is not conducive to the further reduction of the cost of the catalytic combustion gas sensor
[0006] From the above description, it can be seen that the existing catalytic combustion gas sensor based on MEMS technology requires physical vapor deposition

Method used

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  • Catalytic combustion gas sensor based on ceramic-based micro-hotplate and preparation method of sensor
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  • Catalytic combustion gas sensor based on ceramic-based micro-hotplate and preparation method of sensor

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preparation example Construction

[0138] Based on the above embodiment, another embodiment of the present invention also provides a preparation method for preparing the catalytic combustion gas sensor described in the above embodiment, the preparation method is as follows Figure 8 as shown, Figure 8 A schematic flow diagram of a preparation method provided by an embodiment of the present invention, the preparation method comprising:

[0139] Step S11: providing a silicon substrate, the silicon substrate has a first surface and a second surface opposite to each other; the first surface has a central heating area and a peripheral supporting area.

[0140] For the material and thickness of the silicon substrate, reference may be made to the above description, which will not be repeated here.

[0141] Step S12: forming a film layer of ceramic slurry on the first surface.

[0142] The ceramic slurry is prepared according to the desired target properties of the ceramic membrane. Ceramic slurry can be composed o...

Embodiment 1

[0176] Provide a double-sided polished double-sided oxidized 4-inch monocrystalline silicon wafer with 100 crystal orientation, then ultrasonically clean it with acetone for 15 minutes, then ultrasonically clean it with isopropanol for 5 minutes, then clean it with deionized water for 5 minutes, and blow it with nitrogen Dry; select ceramic powder with appropriate specifications, add organic carrier, configure ceramic slurry, print on the wafer by screen printing, and dry at 120°C for 10 minutes; put the dried wafer into In a muffle furnace, sinter at 1000°C for 30 minutes to obtain a dense and hard ceramic film with a thickness of 10 um, and the surface of the ceramic film is treated by grinding and polishing, so that the surface roughness of the ceramic film is controlled at 0.2 um.

[0177] Print a snake-shaped heating resistor array and a heating electrode array with a length and width of 300um×300um on the ceramic film by screen printing, dry at 120°C for 5min, and sinter ...

Embodiment 2

[0180] Provide a double-sided polished double-sided unoxidized 6-inch monocrystalline silicon wafer with 100 crystal orientation, then ultrasonically clean it with acetone for 10 minutes, then ultrasonically clean it with isopropanol for 10 minutes, then clean it with deionized water for 5 minutes, and clean it with nitrogen gas Blow dry; choose ceramic powder of appropriate specifications, add organic carrier, configure ceramic slurry, use tape casting to make the ceramic slurry form a film on the wafer, and dry at 150 ° C for 10 minutes; dry the The wafer was placed in a muffle furnace and sintered at 1000°C for 30 minutes to obtain a dense and hard ceramic film with a thickness of 20 um. The surface of the ceramic film was treated by grinding and polishing, so that the surface roughness of the ceramic film was controlled at 0.2 um.

[0181] Print a serpentine heating resistor array and heating electrode array with a length and width of 400um×400um on the ceramic film by scre...

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Abstract

The invention discloses a catalytic combustion gas sensor based on a ceramic-based micro-hotplate and a preparation method of the sensor. A ceramic film and a heating layer are sequentially formed onthe first surface of a silicon substrate to form the ceramic-based micro-hotplate; the ceramic film is formed by sintering set ceramic slurry; the heating layer is formed by sintering set conductive slurry; and the ceramic film and the heating layer are both formed by a high-temperature sintering process and have the relatively good high temperature resistance, so that compared with the prior artthat the heating layer is formed by physical vapor deposition of low-temperature process conditions, the heating layer formed by the high-temperature sintering process has the better high temperatureresistance, and the stability and the reliability can be improved. By adjusting compositions of the ceramic slurry, the thermal conductivity of the ceramic film can be adjusted and the problem of relatively rapid heat dissipation is avoided, so that the heating power consumption is reduced. Compared with chemical vapor deposition and physical vapor deposition equipment, equipment for forming the ceramic film and the heating layer by sintering the corresponding slurry is relatively low in equipment cost, and the manufacturing cost is reduced.

Description

technical field [0001] The invention relates to the technical field of electronic device manufacturing, and more specifically relates to a catalytic combustion gas sensor based on a ceramic-based micro-hot plate and a preparation method thereof. Background technique [0002] With the rapid development of the transportation industry, CO and NO in vehicle exhaust x , SO x These toxic gases and secondary pollutants have caused serious threats to people's health. Based on this, new energy fuel cell vehicles are gradually being developed. Fuel cell vehicles only consume hydrogen and oxygen, and generate electricity while producing water. This "zero emission" can be said to be the ultimate form of new energy vehicles. However, in view of the wide explosion range of hydrogen, easy diffusion, and difficulty in storage, hydrogen leakage detection in hydrogen fuel cell vehicles is an important early warning mechanism to ensure the safety of vehicle personnel. Therefore, highly stab...

Claims

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Application Information

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IPC IPC(8): G01N27/12
CPCG01N27/125
Inventor 王锦张克栋冯奇崔铮楚延鹏李智星周乾飞刘福星
Owner SAIC MOTOR
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