Preparation method for vanadium dioxide films

Abstract

The invention discloses a preparation method for vanadium dioxide films; and an atomic layer deposition film preparation technology and a vacuum oxygen partial pressure aftertreatment annealing process are adopted. The atomic layer deposition technology is adopted to alternately inject precursors, needed by preparation of two different vanadium oxide films , into an atomic layer deposition reaction cavity for chemical absorption and chemical reaction with the surface of a substrate layer to prepare the vanadium oxide films. The annealing treatment is performed in an oxygen-injected annealing furnace to form valence-state unified crystallized vanadium pentoxide films; and the vanadium pentoxide films are positioned in a vacuum annealing furnace with a certain oxygen partial pressure for annealing to prepare crystallized vanadium dioxide films. The atomic layer deposition film preparation method has such characteristics as high automation degree, precise and controllable thickness of thefilms, good uniformity of the films, good repeatability and high bonding strength between the films and the substrate layer. The vanadium dioxide films have excellent temperature-infrared characteristics, and can be applied to the research, the development and the application of thermally induced phase change devices.

Description

technical field [0001] The invention relates to a method for preparing a vanadium dioxide thin film, belonging to the technical field of material preparation. Background technique [0002] Building energy consumption refers to the energy consumed by people in their daily work and life due to heating, air conditioning, lighting, cooking, etc. In my country, the current energy consumption of air conditioners accounts for about 70% of the total building energy consumption, and about 22% of the total energy consumption (building energy consumption, industrial energy consumption, agricultural energy consumption and transportation energy consumption). Building energy conservation has become a topic of common concern in the world. Improving the energy utilization rate in buildings is the energy research focus of the Building Festival. Its purpose is to use energy rationally and continuously improve energy utilization efficiency under the condition of ensuring the comfort of buildin...

AI Technical Summary

Problems solved by technology

The magnetron sputtering method is to form a film by sputtering a vanadium target under high pressure, and prepare a vanadium dioxide film with the subsequent annealing process. The uniformity and controllability of the film thickness are poor.

In addition, the magnetron sputtering method is difficult to form films on curved surfaces and other complex surfaces, and it is difficult to be widely used

The preparation of vanadium dioxide thin films by sol-gel method has the disadvantages of unfriendly environment, difficulty in guaranteeing thickness uniformity and accuracy, etc.

In addition, the sol-gel method is difficult to form films on large-area substrates and surfaces with complex structures.

The vanadium dioxide film prepared by chemical vapor deposition cannot be widely used due to high reaction temperature, large damage to the substrate, and difficulty in accurately controlling the film thickness.

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