Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Moisturizing and repairing essence lotion and preparation method thereof

A technology of essence milk and emulsifier, applied in the field of skin care products, can solve the problems of difficult absorption of functional nutrients, skin side effects, skin inflammation, etc., and achieve the effect of significant use effect, skin barrier repair, and easy absorption.

Inactive Publication Date: 2020-06-26
广州帝臣生物科技股份有限公司
View PDF1 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

With the development of science and technology, more and more cosmetics are used for skin moisturizing and repairing. However, most of the repairing ingredients used for skin moisturizing and repairing cosmetics are chemical compounds, and the functional nutrients are not easily absorbed. Long-term use will also damage the The skin will produce certain side effects, and even cause adverse reactions such as skin inflammation

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Moisturizing and repairing essence lotion and preparation method thereof
  • Moisturizing and repairing essence lotion and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Prepare each raw material according to the proportion shown in Table 1, and the preparation method of the moisturizing and repairing essence milk provided by this embodiment includes the following steps:

[0027] (1) Emulsifier, potassium cetyl phosphate, plant bionic sebum agent, emollient, polydimethylsiloxane, shea butter oil, cetearyl alcohol, tocopherol, pentaerythritol tetrakis (bi-tert) Butyl hydroxyhydrocinnamate) is added to the oil pan, stirred and heated to 85°C to dissolve completely for later use;

[0028] (2) Add water, disodium edetate, allantoin, hydroxyethyl urea, glycerol polymethacrylate, panthenol, and xylitol into the emulsification pot, start stirring at 20 rpm, and homogenize at a high speed 2 minutes until completely dissolved;

[0029] (3) Disperse xanthan gum and acrylic acid (ester) / C10-30 alkanol acrylate crosslinked polymer with butanediol, add to emulsification pot and homogenize for 2 minutes to completely dissolve, heat to 85°C, homogeni...

Embodiment 2

[0033] Prepare each raw material according to the proportion shown in Table 1, and the preparation method of the moisturizing and repairing essence milk provided by this embodiment includes the following steps:

[0034] (1) Emulsifier, potassium cetyl phosphate, plant bionic sebum agent, emollient, polydimethylsiloxane, shea butter oil, cetearyl alcohol, tocopherol, pentaerythritol tetrakis (bi-tert) Butyl hydroxyhydrocinnamate) is added to the oil pan, stirred and heated to 80°C to dissolve completely for later use;

[0035] (2) Add water, disodium edetate, allantoin, hydroxyethyl urea, glycerol polymethacrylate, panthenol, and xylitol into the emulsification pot, start stirring at 10 rpm, and homogenize at a high speed 5 minutes until completely dissolved;

[0036] (3) Use butanediol to disperse xanthan gum and acrylic acid (ester) / C10-30 alkanol acrylate crosslinked polymer, add to an emulsification pot and homogenize for 1 minute to completely dissolve, heat to 80°C, and ...

Embodiment 3

[0040] Prepare each raw material according to the proportion shown in Table 1, and the preparation method of the moisturizing and repairing essence milk provided by this embodiment includes the following steps:

[0041] (1) Emulsifier, potassium cetyl phosphate, plant bionic sebum agent, emollient, polydimethylsiloxane, shea butter oil, cetearyl alcohol, tocopherol, pentaerythritol tetrakis (bi-tert) Butyl hydroxyhydrocinnamate) is added to the oil pan, stirred and heated to 90°C to dissolve completely for later use;

[0042] (2) Add water, disodium edetate, allantoin, hydroxyethyl urea, glycerol polymethacrylate, panthenol, and xylitol into the emulsification pot, start stirring at 30 rpm, and homogenize at a high speed 1 minute until completely dissolved;

[0043] (3) Use butanediol to disperse xanthan gum and acrylic acid (ester) / C10-30 alkanol acrylate crosslinked polymer, then add to an emulsification pot and homogenize for 5 minutes to completely dissolve, heat to 90°C,...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a moisturizing and repairing essence lotion and a preparation method thereof. The moisturizing and repairing essence lotion comprises the following raw materials of microzyme fermentation lysate filtrate, a grape seed extract, a gentian root extract, a plant bionic sebum agent, polyglutamic acid, an emulsifying agent, potassium cetyl phosphate, an emollient, polydimethylsiloxane, butyrospermum parkii sheabutter oil, cetearyl alcohol, tocopheryl, pentaerythrityl tetra-di-t-butyl hydroxyhydrocinnamate, a chelating agent, allantoin, hydroxyethyl urea, glyceryl polymethacrylate, panthenol, xanthan gum and the like. The moisturizing and repairing essence lotion provided by the invention has the advantages of being notable in use efficacy, mild in properties, non-irritating and free from side effects, and is suitable for all of people to use; all the raw materials are reasonably compounded, so that the obtained moisturizing and repairing essence lotion is uniform andsoft in texture, enables face skin to be tender, fine and smooth, flat, glossy and transparent; and a production technology provided by the invention is simple, low in cost, safe and environmentally-friendly and has extremely high economic value.

Description

technical field [0001] The invention relates to the technical field of skin care products, in particular to a moisturizing and repairing essence milk and a preparation method thereof. Background technique [0002] Ultraviolet damage, genetics, skin diseases, aging, hormone decline, health conditions, irritating skin care products, etc. can all degrade the skin's own repairing substances, slow down the repairing system, and weaken the skin's barrier function, making the skin worse. All kinds of water problems come one after another, such as weak water holding capacity, uneven skin tone, sensitive redness, red blood streaks, dry powder, peeling skin, rough and dull skin, etc. With the development of science and technology, more and more cosmetics are used for skin moisturizing and repairing. However, most of the repairing ingredients used for skin moisturizing and repairing cosmetics are chemical compounds, and the nutritional ingredients are not easy to be absorbed. The skin...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9789A61K8/9728A61K8/64A61K38/01A61Q19/00A61Q17/00A61P17/04A61P17/02A61P17/00
CPCA61K8/9728A61K8/9789A61K8/645A61Q19/00A61Q19/004A61Q17/00A61K36/87A61K36/515A61K38/011A61P17/00A61P17/02A61P17/04A61K2800/85A61K2800/5922
Inventor 刘朝松
Owner 广州帝臣生物科技股份有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com