A kind of electrochromic film and its preparation method and application
An electrochromic and thin-film technology, which is applied in vacuum evaporation plating, coating, sputtering plating, etc., can solve problems such as complex process, difficulty in stable regulation of film performance, and difficulty in process control
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0019] The invention provides a method for preparing an electrochromic thin film, comprising the following steps:
[0020] (1) Deposit metal M on the surface of the substrate by magnetron sputtering, and obtain a metal film on the surface of the substrate; wherein M is metal vanadium or niobium;
[0021] (2) irradiating the metal thin film with a high-energy atomic oxygen beam to obtain an electrochromic thin film.
[0022] The invention adopts the magnetron sputtering method to deposit the metal M on the surface of the substrate to obtain the metal thin film on the surface of the substrate.
[0023] In the present invention, the metal M is metal vanadium or niobium. In the present invention, before depositing the metal M, solvent cleaning and glow cleaning are performed sequentially on the substrate. The solvent cleaning method is preferably ultrasonic cleaning using at least one of acetone, petroleum ether, and absolute ethanol, more preferably Use acetone, petroleum ether...
Embodiment 1
[0037] The instruments used in the embodiment of the present invention include: ABS-1200 type multi-arc combination unbalanced magnetron sputtering coating device; Simul-LEO-T 450 type space atomic oxygen effect ground simulation test device.
[0038] A glass slide is used as the substrate, and its geometric dimensions are: 15mm×10mm×5mm.
[0039] Preparation of electrochromic Nb on glass slide surface 2 o 5 Thin films, comprising the following process steps:
[0040] (1) Substrate preparation
[0041] The glass slides were ultrasonically cleaned with acetone, petroleum ether and absolute ethanol in sequence, and finally rinsed with deionized water and quickly dried with nitrogen gas.
[0042] (2) Substrate installation and pretreatment
[0043] Put the substrate sample cleaned in the previous step into the ABS-1200 multi-arc combined unbalanced magnetron sputtering coating device, so that the distance between the center of the substrate and the center of the Nb target sur...
Embodiment 2
[0054] Preparation of electrochromic V on glass slide surface 2 o 5 Thin films, comprising the following process steps:
[0055] (1) Substrate preparation
[0056] The glass slides were ultrasonically cleaned with acetone, petroleum ether and absolute ethanol in sequence, and finally rinsed with deionized water and quickly dried with nitrogen gas.
[0057] (2) Substrate installation and pretreatment
[0058] Put the substrate sample cleaned in the previous step into the ABS-1200 multi-arc combined unbalanced magnetron sputtering coating device, so that the distance between the center of the substrate and the center of the V target surface is kept at 70mm. In the film preparation stage, the substrate sample is still in front of the target, and the surface of the substrate sample is parallel to the target surface. Evacuate the vacuum chamber, when the vacuum degree reaches 1.5×10 -4 Pa, fill the vacuum chamber with argon gas to maintain the pressure of the vacuum chamber at...
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More