Double heat treatment and rapid formation method for battery cell coated with artificial SEI film negative pole piece
A membrane anode and cell technology, applied in the field of double heat treatment and rapid formation of cells, can solve the problems of lithium precipitation or black spot, low cell capacity consistency, prolonged working hours, etc., to avoid poor voltage consistency and improve Cyclic stability, the effect of ensuring voltage consistency
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Embodiment 1
[0043] 1) Coating a silicon carbon negative electrode material ([SiO 2 @Graphite) aqueous solution, the content of silicon oxide in the silicon carbon negative electrode material is 2wt%, and then dried at 90°C for 2 hours, forming a silicon carbon negative electrode layer with a thickness of 117 μm on the surface of the current collector;
[0044] 2) Use molecular layer deposition equipment (Note: Boinst MLD, Beijing Boying Technology Co., Ltd., Boinst-PMLD100) to combine trimethylaluminum (TMA) and ethylene glycol (EG) according to: TMA—pulse (0.01s)—blowing The sequence of sweeping (40s)—EG—pulse (0.01s)—purge (70s) is alternately deposited on the surface of the silicon carbon coating. The thickness of the formed polymer aluminum film layer is 0.8 μm, and the mass ratio of trimethylaluminum to ethylene glycol is 1:3;
[0045] 3) After lamination, the temperature of the upper and lower splints of the hot-press tooling is set to 80°C, the pressure of the upper and lower spli...
Embodiment 2
[0055] 1) Coat the surface of the copper current collector with an aqueous solution of silicon-carbon anode material ([SiO2@Graphite) with a concentration of 45wt%. The content of silicon oxide in the silicon-carbon anode material is 2wt%. A silicon carbon negative electrode layer with a thickness of 117 μm is formed on the surface;
[0056] 2) Use molecular layer deposition equipment (Note: Boinst MLD, Beijing Boying Technology Co., Ltd., Boinst-PMLD100) to combine trimethylaluminum (TMA) and ethylene glycol (EG) according to: TMA—pulse (0.01s)—blowing The sequence of sweeping (40s)—EG—pulse (0.01s)—purge (70s) is alternately deposited on the surface of the silicon carbon coating. The thickness of the formed polymer aluminum film layer is 0.8 μm, and the mass ratio of trimethylaluminum to ethylene glycol is 1:3;
[0057] 3) After lamination, the temperature of the upper and lower splints of the hot-press tooling is set to 100°C, the pressure of the upper and lower splints is...
Embodiment 3
[0067] 1) Coating a silicon carbon negative electrode material ([SiO 2 @Graphite) aqueous solution, the content of silicon oxide in the silicon carbon negative electrode material is 2wt%, and then dried at 90°C for 2 hours, forming a silicon carbon negative electrode layer with a thickness of 117 μm on the surface of the current collector;
[0068] 2) Use molecular layer deposition equipment (Note: Boinst MLD, Beijing Boying Technology Co., Ltd., Boinst-PMLD100) to combine trimethylaluminum (TMA) and ethylene glycol (EG) according to: TMA—pulse (0.01s)—blowing The sequence of sweeping (40s)—EG—pulse (0.01s)—purge (70s) is alternately deposited on the surface of the silicon carbon coating. The thickness of the formed polymer aluminum film layer is 0.8 μm, and the mass ratio of trimethylaluminum to ethylene glycol is 1:3;
[0069] 3) The temperature of the upper and lower splints of the hot-press tooling after lamination is set to 120°C, the pressure of the upper and lower spli...
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