Aluminizing medium-free aluminizing method for surface of carbon steel
A carbon steel and aluminizing technology, applied in the field of aluminizing preparation technology on the surface of carbon steel, can solve the problems of easy adhesion, long aluminizing cycle, irritation, etc., and achieve dense coating, short aluminizing cycle, and production efficiency. high effect
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Embodiment 1
[0034] The carbon steel substrate with a size of 2cm×2cm is polished step by step with 150#, 400#, 1000# and 2000#, then ultrasonically degreased with acetone for 5min, dried in cold air, and placed in a drying dish for use.
[0035] Place the processed sample in the vacuum chamber of the ion sputtering equipment, and discharge the air in the vacuum chamber. When the pressure of the vacuum chamber is less than 0.01Pa, turn on the heating switch and control the temperature of the vacuum chamber at about 100°C.
[0036] Argon is introduced into the vacuum chamber, and the pressure of the vacuum chamber is maintained at 0.9 Pa by adjusting the inlet valve and the outlet valve.
[0037] Turn on the ion sputtering power supply, adjust the substrate voltage at -500V, and maintain it for 5min.
[0038] Reduce the substrate voltage to -100V, start the sputtering current, adjust the sputtering current to about 25A, and maintain it for 120min;
[0039] Adjust the sputtering current to ...
Embodiment 2
[0041] A carbon steel substrate with a size of 2cm×3cm was blasted with 300-mesh diamond for 5 minutes, then ultrasonically dusted with acetone for 5 minutes, dried in cold air, and placed in a drying dish for use.
[0042] Place the processed sample in the vacuum chamber of the ion sputtering equipment, and discharge the air in the vacuum chamber. When the pressure of the vacuum chamber is less than 0.01Pa, turn on the heating switch and control the temperature of the vacuum chamber at about 300°C.
[0043] Argon is introduced into the vacuum chamber, and the pressure of the vacuum chamber is maintained at 1.5 Pa by adjusting the inlet valve and the outlet valve.
[0044] Turn on the ion sputtering power supply, adjust the substrate voltage at -600V, and maintain it for 10min.
[0045] Reduce the substrate voltage to -300V, start the sputtering current, adjust the sputtering current to about 60A, and maintain it for 60min;
[0046] Adjust the sputtering current to 0A, the su...
Embodiment 3
[0048] The carbon steel substrate with a size of 3cm×4cm is polished step by step with 150#, 400#, 1000# and 2000#, then ultrasonically degreased with acetone for 10min, dried in cold air, and placed in a drying dish for use.
[0049] Place the treated sample in the vacuum chamber of the ion sputtering equipment, and discharge the air in the vacuum chamber. When the pressure of the vacuum chamber is less than 0.01Pa, turn on the heating switch and control the temperature of the vacuum chamber at about 500°C.
[0050] Argon is introduced into the vacuum chamber, and the pressure of the vacuum chamber is maintained at 2.5 Pa by adjusting the inlet valve and the outlet valve.
[0051] Turn on the ion sputtering power supply, adjust the substrate voltage at -800V, and maintain it for 5min.
[0052] Reduce the substrate voltage to -500V, start the sputtering current, adjust the sputtering current to about 80A, and maintain it for 40min;
[0053] Adjust the sputtering current to 0A...
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