Bullet, preparation method thereof and medical instrument
A technology of medical equipment and bullets, which is applied in the field of surface coating, can solve problems such as low strength and poor wear resistance of bullet bodies, and achieve the effect of improving service life and improving wear resistance and wear reduction performance
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[0032] The embodiment of the present invention also provides a method for preparing a projectile body, comprising: forming a composite film layer on the projectile body body, which can effectively improve the wear-resistance and wear-reducing performance of the film layer, thereby increasing the service life of the projectile body.
[0033] Specifically, the formation method of each layer in the composite film layer is independently selected from any one of physical vapor deposition (PVD), plasma enhanced chemical vapor deposition (PE-CVD) and ion source coating method, wherein, The physical vapor deposition method is magnetron sputtering or arc ion plating. The above coating methods are all existing methods, and the principles thereof will not be described in detail.
[0034] In a preferred embodiment, the nitride film layer 103, the metal film layer 104, the metal carbide film layer 105, and the diamond-like carbon film layer 106 with dopants are all formed by magnetron sput...
Embodiment 1
[0041] The present embodiment provides a kind of preparation method of projectile body, it comprises the following steps:
[0042] S1: Put the projectile body 101 in a fully automatic cleaning line for 40 minutes, then clamp it, place it in a vacuum chamber, heat it to 100°C, and pump it to 4×10 -3 Vacuum degree above Pa.
[0043] S2: Perform pretreatment on the cleaned projectile body 101 using a multifunctional vacuum coating equipment plasma etching technology, wherein the plasma etching parameters are: bias voltage 200V, auxiliary anode current 65A, argon gas flow rate 60mL / min.
[0044] S3: The pretreated projectile body 101 adopts the magnetron sputtering technology of multifunctional vacuum coating equipment, first deposits a TiN film layer (nitride film layer 103), and the deposition time is 75 minutes, wherein the magnetron sputtering parameters are: nitrogen flow rate 60mL / min, Ti target power 5kw, argon flow 120mL / min.
[0045] S4: On the basis of step S3, adopt m...
Embodiment 2
[0051] The present embodiment provides a kind of preparation method of projectile body, it comprises the following steps:
[0052] S1: Place the projectile body 100 in a fully automatic cleaning line for 40 minutes, then clamp it, place it in a vacuum chamber, heat it to 100°C, and pump it to 4×10 -3 Vacuum degree above Pa.
[0053] S2: The cleaned bullet body substrate is pretreated with the plasma etching technology of the multifunctional vacuum coating equipment. The plasma etching parameters are: bias voltage 220V, auxiliary anode current 80A, and argon gas flow rate 60mL / min.
[0054] S3: The magnetron sputtering technology of the multifunctional vacuum coating equipment is used for the pretreated bullet body substrate, and the CrN film layer (nitride film layer 103) is deposited first, and the deposition time is 75min, wherein the magnetron sputtering parameters are: nitrogen flow rate 60mL / min, the Cr target power is 5kw, and the argon flow rate is 120mL / min.
[0055...
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Abstract
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