Air suction film , as well as preparation method and application thereof
A film and getter layer technology, applied in metal material coating process, vacuum evaporation coating, coating and other directions, can solve the problems of vacuum degree drop, affect product performance, heat dissipation capacity and other problems, improve service life, strengthen Capillary action, effect of improving corrosion resistance and oxidation resistance
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[0027] The preparation method of above-mentioned getter film, comprises the steps:
[0028] (1) prepare substrate 1, utilize sodium carbonate degreasing agent to clean substrate;
[0029] (2) Place the cleaned substrate 1 in an oven, and bake it for 1-60 minutes at a temperature of 25-100° C.;
[0030] (3) Perform glow cleaning on the substrate 1 after step (2), the voltage of glow cleaning is 100-1000V, the working pressure is 1-100Pa, and the cleaning time is 5-60min;
[0031] (4) Utilize magnetron sputtering method to deposit Cr thin film on substrate 1, as bottom layer 2;
[0032] (5) Deposit a Pd thin film on the primer layer 2 as the getter layer 3 by magnetron sputtering.
[0033] In step (4) and step (5), when preparing the primer layer 2 and the getter layer 3, the vacuum degree of the deposition chamber reaches 6.0×10 -5 ~3×10 -3 Pa, the working pressure during the deposition process is 0.1-2.0Pa, the sputtering current is 0.01-10A, and the power density is 10-20...
Embodiment 1
[0035] A getter film, which is composed of a primer layer and a getter layer grown on the surface of a substrate in sequence, the primer layer is made of Cr, and the getter layer is made of Pd; the primer layer and the getter layer are both Columnar grain structure. In this embodiment 1, a water-cooled plate is used as the base material. Both the primer layer and the getter layer are deposited by magnetron sputtering.
[0036] Among them, the purity of Cr in the primer layer was 99.96%, and the purity of Pd in the getter layer was 99.98%.
[0037] In the getter film of Example 1, the thickness of the primer layer was 0.005 μm, and the thickness of the getter layer was 0.5 μm.
[0038] The preparation method of the getter film of this embodiment 1, comprises the steps:
[0039] (1) Prepare the base material of the water-cooled plate, and use sodium carbonate degreasing agent to clean the water-cooled plate;
[0040] (2) Place the cleaned water-cooled plate in an oven, and...
Embodiment 2
[0046] A getter film, which is composed of a primer layer and a getter layer grown on the surface of a substrate in sequence, the primer layer is made of Cr, and the getter layer is made of Pd; the primer layer and the getter layer are both Columnar grain structure. In Example 2, the base material is a vapor chamber. Both the primer layer and the getter layer are deposited by magnetron sputtering.
[0047] Among them, the purity of Cr in the primer layer was 99.96%, and the purity of Pd in the getter layer was 99.98%.
[0048] In the getter film of Example 2, the thickness of the primer layer was 1 μm, and the thickness of the getter layer was 1 μm.
[0049] The preparation method of the getter film of this embodiment 2, comprises the steps:
[0050] (1) Prepare the base material of the vapor chamber, and clean the vapor chamber with a sodium carbonate degreasing agent;
[0051] (2) Place the cleaned vapor chamber in an oven, and bake for 35 minutes at a temperature of 6...
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