High-temperature-resistant near-infrared absorption high-entropy ceramic and preparation method thereof

A near-infrared, high-temperature-resistant technology, applied in the fields of high near-infrared absorption, high-entropy ceramics and their preparation, high-purity, high relative density, can solve problems such as infrared emissivity gap, achieve good relative density, high near-infrared absorption, Good effect of particle size adjustability

Active Publication Date: 2021-02-26
AEROSPACE RES INST OF MATERIAL & PROCESSING TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in general, compared with non-oxide ceramics such as silicon carbide and silicon boride, there is still a significant gap in the infrared emissivity of oxide ceramics.

Method used

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  • High-temperature-resistant near-infrared absorption high-entropy ceramic and preparation method thereof
  • High-temperature-resistant near-infrared absorption high-entropy ceramic and preparation method thereof
  • High-temperature-resistant near-infrared absorption high-entropy ceramic and preparation method thereof

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preparation example Construction

[0042]The present invention provides a method for preparing high-temperature resistant near-infrared absorption high-entropy ceramics, which is used to prepare the above-mentioned high-temperature resistant near-infrared absorption high-entropy ceramics, including the following steps:

[0043](1) Mix the raw material powder of high-entropy ceramics with absolute ethanol in a ball mill tank to obtain a uniformly mixed slurry;

[0044](2) The obtained slurry is dried to obtain a mixed powder, and the dried powder is placed in a high-temperature furnace for calcination to obtain a ceramic powder;

[0045](3) The obtained ceramic powder is put into a spark plasma sintering furnace for high temperature sintering, the atmosphere is vacuum, the sintering temperature is not lower than the sintering temperature in step (2), the sintering time is not longer than 30 min, and the sintering pressure is controlled at 20-40 MPa to obtain High-entropy ceramic block.

[0046]In a preferred embodiment, in step (...

Embodiment 1

[0054]Will Y2O3, Nd2O3, Sm2O3, Eu2O3, Yb2O3, Er2O3, Nb2O5And Ta2O5Press Y2O3: Nd2O3: Sm2O3: Eu2O3: Yb2O3: Er2O3: Nb2O5: Ta2O5=1:1:1:1:1:1:1:1:1:1, and mix in a ball mill tank. The mixing time is 6 hours. The mixing medium is anhydrous ethyl alcohol to obtain a slurry; The slurry is filtered and dried to obtain a mixture powder. The dried powder is put into a high-temperature furnace for calcination. The calcination temperature is 1450°C and the calcination time is 2 hours to obtain high entropy (Y1 / 6Nd1 / 6Sm1 / 6Eu1 / 6Yb1 / 6Er1 / 6)3(Nb1 / 2Ta1 / 2)O7Ceramic powder. Put the high-entropy ceramic powder into a spark plasma sintering furnace for high temperature sintering. The atmosphere is vacuum, the sintering temperature is 1650℃, the sintering time is 4min, the sintering pressure is controlled to 40MPa, the vacuum degree is 8Pa, and the heating rate is 100℃ / min, the obtained high temperature resistant near-infrared absorption high-entropy ceramic has a purity of 100 wt%, a relative density o...

Embodiment 2

[0056]Will Y2O3, Nd2O3, Sm2O3, Eu2O3, Yb2O3, Er2O3, Nb2O5And Ta2O5Press Y2O3: Nd2O3: Sm2O3: Eu2O3: Yb2O3: Er2O3: Nb2O5: Ta2O5=1:1:1:1:1:1:1:1:1:1, and mix in a ball mill tank. The mixing time is 6 hours. The mixing medium is anhydrous ethyl alcohol to obtain a slurry; The slurry is filtered and dried to obtain a mixture powder. The dried powder is put into a high-temperature furnace for calcination. The calcination temperature is 1450°C and the calcination time is 2 hours to obtain high entropy (Y1 / 6Nd1 / 6Sm1 / 6Eu1 / 6Yb1 / 6Er1 / 6)3(Nb1 / 2Ta1 / 2)O7Ceramic powder. Put the high-entropy ceramic powder into a spark plasma sintering furnace for high temperature sintering. The atmosphere is vacuum, the sintering temperature is 1600℃, the sintering time is 10min, the sintering pressure is controlled to 40MPa, the vacuum degree is 8Pa, and the heating rate is 120℃ / min, the obtained high temperature resistant near-infrared absorption high-entropy ceramic has a purity of 100% by weight, a relative d...

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Abstract

The invention relates to high-temperature-resistant near-infrared absorption high-entropy ceramic and a preparation method thereof. The high-entropy ceramic is prepared from the following raw materials in equal molar ratio: 1 part of yttrium oxide, 1 part of neodymium oxide, 1 part of samarium oxide, 1 part of europium oxide, 1 part of ytterbium oxide, 1 part of erbium oxide, 1 part of niobium oxide and 1 part of tantalum oxide. The purity of the high-temperature-resistant near-infrared absorption high-entropy ceramic is not lower than 99wt%, the relative density is not lower than 98%, and theabsorptivity of the high-temperature-resistant near-infrared absorption high-entropy ceramic in a near-infrared band of 0.25-2.5 microns is not lower than 0.9. The high-temperature-resistant near-infrared absorption high-entropy ceramic is obtained by utilizing a high-entropy technology, introducing not less than 6 rare earth metal elements into niobium tantalate at the same time and adjusting the absorption energy level of the forbidden band width to enable the forbidden band width to be matched with the near-infrared wavelength, and the technological process is simple, rapid, flexible and controllable.

Description

Technical field[0001]The invention belongs to the field of high-temperature thermal protection ceramics, and relates to a high-temperature resistant near-infrared absorption high-entropy ceramic and a preparation method thereof, in particular to a high-purity, high relative density, high near-infrared absorption high-entropy ceramic and a preparation method thereof.Background technique[0002]The surface of the thermal protection material of the new generation of hypersonic aircraft needs to be coated with a layer of material with high infrared emissivity (ie absorption rate) to improve the thermal protection ability of the thermal protection material at high and ultra-high temperatures. However, the current high infrared emissivity materials have insufficient emissivity in the infrared band. At the same time, they also face the problem of structural instability and oxidation at high temperatures, which will further reduce their infrared emissivity at high and ultra-high temperatures,...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B35/50C04B35/622C04B35/645
CPCC04B35/495C04B35/622C04B35/645C04B2235/3224C04B2235/3225C04B2235/6581C04B2235/6562C04B2235/6567C04B2235/666C04B2235/96
Inventor 向会敏赵子樊周延春彭志坚戴付志
Owner AEROSPACE RES INST OF MATERIAL & PROCESSING TECH
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