A kind of raw material composition for preparing photocurable resin, photocurable resin prepared therefrom and application thereof

A technology of raw material composition and photocurable resin, which is applied in the field of curable resin synthesis, can solve the problems of reduced impact resistance, etc., and achieve the effects of low shrinkage, excellent mechanical and thermal properties, and high strength
CN112480324BActive Publication Date: 2022-07-19FUJIAN INST OF RES ON THE STRUCTURE OF MATTER CHINESE ACAD OF SCI
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
FUJIAN INST OF RES ON THE STRUCTURE OF MATTER CHINESE ACAD OF SCI
Publication Date
2022-07-19

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Abstract

The present application discloses a raw material composition for preparing a photocurable resin, a photocurable resin prepared therefrom and use thereof, belonging to the field of curable resin synthesis. The raw material composition for preparing the photocurable resin comprises cyanate ester, photocurable prepolymer, diluent, catalyst and photoinitiator. The photocurable interpenetrating polymer network structure resin is obtained from the composition through ultraviolet light curing and thermal curing. The raw material composition for preparing the photocurable resin of the present application has both the characteristics of rapid prototyping of photosensitive resin and the characteristics of excellent heat resistance and moisture resistance of cyanate ester. The photocurable interpenetrating polymer network structure resin of the present application has low viscosity and is easy to process, and has the advantages of high strength, high temperature resistance, low shrinkage, low water absorption and low dielectric constant, etc., and can be used for 3D printing, coating, bonding, etc. Agents, aerospace materials, printed circuit boards, invisibility cloaks, artificial satellites, flame retardant materials and electronic packaging.
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Description

technical field

[0001] The present application relates to a raw material composition for preparing a photocurable resin, a photocurable interpenetrating polymer network structure resin prepared therefrom, and use thereof, belonging to the field of curable resin synthesis. Background technique

[0002] In the 1950s and 1960s, R.Stroh and H.Gerber synthesized cyanate esters for the first time. In 1963, German scientist E. Grigat used phenolic compounds to react with hydrogen halide to synthesize cyanate esters, and then Bayer company also conducted research on cyanate esters. However, due to the lack of understanding of the polymerization mechanism of cyanate esters and the improper processing methods of resins, the popularization and use of cyanate esters are limited. In 1976, Miles introduced 70% cyanate ester butanone solution resin and used it in the electronics industry. Cyanate ester resin has attracted the attention of people from all walks of life in recent years due...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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