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Method for etching a sub-wavelength periodic array by modifying a mask on the surface of glass

A sub-wavelength, periodic technology, applied in the field of micro-nano material optics, can solve the problems of complex mask steps and low anti-reflection rate, and achieve the effect of reducing reflection, reducing reflection, and facilitating integration and development.

Pending Publication Date: 2021-05-07
墨光新能科技(苏州)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The mask prepared by this method has complex steps and low anti-reflection rate

Method used

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  • Method for etching a sub-wavelength periodic array by modifying a mask on the surface of glass
  • Method for etching a sub-wavelength periodic array by modifying a mask on the surface of glass
  • Method for etching a sub-wavelength periodic array by modifying a mask on the surface of glass

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] The original piece of fused silica glass was taken as the blank control group.

[0037] The original fused silica glass was ultrasonically cleaned with acetone, ethanol, deionized water, and ethanol for 5 minutes each, and then dried with a nitrogen gun.

[0038] Use a homogenizer to select 20 μL of the silica dispersion solution dispersed in ethanol ethylene glycol, select silica balls with a diameter of 350 nm, adjust the speed of the homogenizer to 8000 rpm so that the balls are evenly arranged on the glass surface, and spin coat Time 1min.

[0039]After the solvent in the dispersion is volatilized, a dense silica mask is left on the surface; during the process, a hot stage is used to accelerate the volatilization of the solvent. The mass ratio of the dispersion liquid is silicon dioxide powder:ethanol:ethylene glycol=30:35:35.

[0040] Clean and pre-etch the etching chamber before etching to allow the etching parameters to reach a stable state, and then use the Ox...

Embodiment 2

[0047] Take the original K9 glass as the blank control group.

[0048] Clean the original K9 glass with acetone, ethanol, deionized water, and ethanol ultrasonically for 5 minutes each, and then dry it.

[0049] In the example of the present invention, silica balls with a diameter of 500 nm were selected, and the speed of the homogenizer was adjusted to 5500 rpm so that the balls were evenly packed on the glass surface, and the spin coating time was 1 min. The silicate glass original sheet was ultrasonically cleaned with acetone, ethanol, deionized water, and ethanol for 5 minutes each, and then dried with a nitrogen gun.

[0050] Use a homogenizer to select 20 μL of the silica dispersion solution dispersed in ethanol ethylene glycol, select silica balls with a diameter of 500 nm, adjust the speed of the homogenizer to 8000 rpm so that the balls are evenly arranged on the glass surface, and spin coat Time 1min.

[0051] After the solvent in the dispersion is volatilized, a d...

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Abstract

The invention belongs to the field of micro-nano material optics, and particularly relates to a method for etching a sub-wavelength periodic array by modifying a mask on the surface of glass. The invention relates to a method for preparing a sub-wavelength periodic array by mask etching. The method comprises the following steps: washing a silicate glass original sheet with acetone, ethanol, deionized water and ethanol respectively, and drying; selecting a silicon dioxide dispersion liquid well dispersed by ethanol and ethylene glycol by using a spin coater, wherein the diameter of silicon dioxide pellets is 200-500nm; completely volatilizing the solvent in the dispersion liquid; performing etching in a plasma etching bin, wherein etching gas is any one or combination of CHF3 and CF4, the flow is 45-80 sccm, and the etching power is 75-90 W; and cleaning and drying. The method has the advantages that the process is simple; uniform sub-wavelength microstructures can be prepared on different types of glass surfaces; and the reflection reduction effect is good, single-face air-glass reflection is effectively reduced from 5.5% to 3.2% or below, and integration of optical elements is facilitated.

Description

technical field [0001] The invention belongs to the optical field of micro-nano materials, and in particular relates to a method for etching a sub-wavelength periodic array with a glass surface modification mask. Background technique [0002] Display products are an indispensable and important part of the contemporary information society. As an information output display tool, display devices participate in an important link in the interaction between human eyes and machines. The surface reflection of display devices is a common problem in optical glass. The surface reflection is caused by the difference between the refractive index of air and the refractive index of glass. The reflection of ordinary glass is about 6%-8%. The traditional way to reduce the reflection of the glass surface is to coat the glass surface with a single-layer film. The optimal film refractive index is calculated to be 1.22, but the current minimum medium refractive index is around 1.35, and the sing...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00G02B1/118
CPCB81C1/00214B81C1/00206B81C1/00531B81C1/00396B81C1/00404G02B1/118
Inventor 朱嘉陈鑫杰朱鹏臣
Owner 墨光新能科技(苏州)有限公司
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