Preparation method of ytterbium ion doped silicon dioxide laser microspheres
A silicon dioxide, ytterbium ion technology, applied in the field of laser communication, can solve the problems of ion doping uniformity and layer thickness difficult to control, difficult to control the diameter of microspheres, can only be processed by laser, etc., to achieve high optical quality factor , The effect of easy production and processing and easy control
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[0021] 1. The formula of uniformly doped silica microspheres is:
[0022] Main materials: tetraethyl orthosilicate, hexamethyldisiloxane, ethanol;
[0023] Auxiliary materials: nitric acid (PH=1.0), deionized water, doping ions (such as: ytterbium nitrate pentahydrate);
[0024] Main material ratio (molar ratio): hexamethyldisiloxane: tetraethyl orthosilicate: ethanol = 1:6:43;
[0025] Auxiliary material dilute nitric acid ratio (molar ratio): nitric acid (70%): deionized water = 1:150;
[0026] Ratio of main material and dopant ions (molar ratio): 100:(1-2.5)
[0027] Volume ratio of main material and auxiliary material (dilute nitric acid): (28-21):1.
[0028] 2. The three-step method for making uniformly doped silica laser microspheres is as follows:
[0029] Tetraethyl orthosilicate gel was prepared by sol-gel method; filamentous fibers were drawn from the gel; CO 2 Laser fired microspheres.
[0030] Step 1: Gel Preparation
[0031] Measure a certain molar amount o...
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